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Efficient Si Nanowire Array Transfer via Bi‐Layer Structure Formation Through Metal‐Assisted Chemical Etching

dc.contributor.authorMoon, Taehoen_US
dc.contributor.authorChen, Linen_US
dc.contributor.authorChoi, Shinhyunen_US
dc.contributor.authorKim, Chunjoongen_US
dc.contributor.authorLu, Weien_US
dc.date.accessioned2014-05-21T18:02:52Z
dc.date.availableWITHHELD_13_MONTHSen_US
dc.date.available2014-05-21T18:02:52Z
dc.date.issued2014-04en_US
dc.identifier.citationMoon, Taeho; Chen, Lin; Choi, Shinhyun; Kim, Chunjoong; Lu, Wei (2014). "Efficient Si Nanowire Array Transfer via Bi‐Layer Structure Formation Through Metal‐Assisted Chemical Etching." Advanced Functional Materials 24(13): 1949-1955.en_US
dc.identifier.issn1616-301Xen_US
dc.identifier.issn1616-3028en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/106706
dc.publisherWiley Periodicals, Inc.en_US
dc.subject.otherThin‐Film Transistoren_US
dc.subject.otherMetal‐Assisted Chemical Etchingen_US
dc.subject.otherSi Nanowireen_US
dc.subject.otherFlexible Electronicsen_US
dc.subject.otherNanowire Transferen_US
dc.titleEfficient Si Nanowire Array Transfer via Bi‐Layer Structure Formation Through Metal‐Assisted Chemical Etchingen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelEngineering (General)en_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/106706/1/adfm201303180.pdf
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/106706/2/adfm201303180-sup-0001-S1.pdf
dc.identifier.doi10.1002/adfm.201303180en_US
dc.identifier.sourceAdvanced Functional Materialsen_US
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dc.owningcollnameInterdisciplinary and Peer-Reviewed


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