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Power limitations in BARITT devices

dc.contributor.authorKwok, S. P.en_US
dc.contributor.authorHaddad, George I.en_US
dc.date.accessioned2006-04-07T16:26:22Z
dc.date.available2006-04-07T16:26:22Z
dc.date.issued1976-09en_US
dc.identifier.citationKwok, S. P., Haddad, G. I. (1976/09)."Power limitations in BARITT devices." Solid-State Electronics 19(9): 795-807. <http://hdl.handle.net/2027.42/21692>en_US
dc.identifier.urihttp://www.sciencedirect.com/science/article/B6TY5-46VKMG2-1DH/2/7951aa89e96ccc7ca22824c18162ab01en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/21692
dc.description.abstractThe results of a large-signal numerical simulation of the BARITT device using a single-carrier model are given to illustrate the basic transport mechanisms involved in the device. The results of existing first-order small- and large-signal analyses are compared with those computed numerically. Space-charge-limited thermionic injection, spatial velocity modulation, carrier diffusion, premature carrier collection, large-signal electric field depression and the low-field drift region are found to account for the large reduction of power and efficiency of the BARITT device. The maximum power and efficiency of Si uniformly doped and Read structures are found to be approximately 300 W/cm2 and 3%, respectively. The effects of doping profile and material parameters are found to involve a trade off of large-signal handling capability and frequency of operation on one hand vs the negative conductance and thus the Q factor of BARITT devices on the other hand. The excessively high electron mobility in GaAs is found to be detrimental to device operation.en_US
dc.format.extent949498 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherElsevieren_US
dc.titlePower limitations in BARITT devicesen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbsecondlevelElectrical Engineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumElectron Physics Laboratory, Department of Electrical and Computer Engineering, The University of Michigan, Ann Arbor, MI 48109, U.S.A.en_US
dc.contributor.affiliationumElectron Physics Laboratory, Department of Electrical and Computer Engineering, The University of Michigan, Ann Arbor, MI 48109, U.S.A.en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/21692/1/0000083.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1016/0038-1101(76)90158-1en_US
dc.identifier.sourceSolid-State Electronicsen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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