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Rapid melting and quenching with microsecond current pulses

dc.contributor.authorClemens, Bruce M.en_US
dc.contributor.authorGilgenbach, Ronald M.en_US
dc.date.accessioned2006-04-07T20:28:20Z
dc.date.available2006-04-07T20:28:20Z
dc.date.issued1988-01en_US
dc.identifier.citationClemens, Bruce M., Gilgenbach, R. M. (1988/01)."Rapid melting and quenching with microsecond current pulses." Materials Science and Engineering 97(): 105-108. <http://hdl.handle.net/2027.42/27478>en_US
dc.identifier.urihttp://www.sciencedirect.com/science/article/B759M-48HS0T8-G5/2/4f87b9d1ad8cabdc4eb0bc02ae8f75daen_US
dc.identifier.urihttps://hdl.handle.net/2027.42/27478
dc.description.abstractWe report the use of microsecond current pulses to transform layered crystalline Ni---Zr films to amorphous alloys. The starting materials were electron-beam- or sputter-deposited multilayers with a composition modulation wavelength of 34 nm, an average composition of Ni63Zr37 and a total thickness of 680 nm. The electrical pulses were approximately rectangular and about 3 ms in duration, with an intensity of several hundred amperes, directly coupling 1.6-3 J of energy uniformly into the film. By monitoring current and voltage, the reaction and melting of the sample were observed, and the total energy of the pulse was easily computed. A sharp threshold in pulse energy for sample transformation was observed. A simple heat flow calculation demonstrated that the chemical energy released by the reaction and the change in diffusion kinetics as the sample temperature exceeded the glass transition temperature of the amorphous alloy are responsible for this sudden onset. The maximum temperature estimated from this calculation is below the melting point of the constituents, and the cooling rate is 107 - 108 K s-1 which is in agreement with the formation of amorphous alloys.en_US
dc.format.extent349569 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherElsevieren_US
dc.titleRapid melting and quenching with microsecond current pulsesen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbsecondlevelEngineering (General)en_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumNuclear Engineering Department, The University of Michigan, Ann Arbor, MI 48109, U.S.A.en_US
dc.contributor.affiliationotherPhysics Department, General Motors Research Laboratories, Warren, MI 48090-9055, U.S.A.en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/27478/1/0000521.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1016/0025-5416(88)90021-3en_US
dc.identifier.sourceMaterials Science and Engineeringen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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