Low-temperature electronic transport and the Coulomb blockade in oxidized films of bismuth
Cohn, J. L.; Ben-Jacob, Eshel; Uher, Ctirad
1990-08-06
Citation: Cohn, J. L., Ben-Jacob, E., Uher, C. (1990/08/06)."Low-temperature electronic transport and the Coulomb blockade in oxidized films of bismuth." Physics Letters A 148(1-2): 110-114. <http://hdl.handle.net/2027.42/28428>
Abstract: We present low-temperature (0.2 T e2.
DOIs: http://dx.doi.org/10.1016/0375-9601(90)90587-E
URI: http://www.sciencedirect.com/science/article/B6TVM-46VCG4Y-G3/2/2a65df26b58805b18457e75d5bb51818
Handle: http://hdl.handle.net/2027.42/28428
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