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D-band (110-170 GHz) InP gunn devices
Kamoua, R.; Eisele, Heribert; Haddad, George I.
1993-11
Citation:Kamoua, R., Eisele, H., Haddad, G. I. (1993/11)."D-band (110-170 GHz) InP gunn devices." Solid-State Electronics 36(11): 1547-1555. <http://hdl.handle.net/2027.42/30504>
Abstract: This paper reports on the development of InP Gunn sources for operation in the D-band (110-170 GHz). n+-n-n+ structures with flat doping as well as graded doping profiles have been considered. Oscillations were obtained at 108.3 GHz from a 1 [mu]m structure with a uniform n doping of 2.5 x 1016 cm-3. The CW RF output power was 33 mW. A 1 [mu]m graded structure with an n doping increasing linearly from 7.5 x 1015 to 2.0 x 1016 cm-3 has resulted in 20 mW at 120 GHz and 10 mW at 136 GHz. These results are believed to correspond to a fundamental mode operation and represent the state-of-the-art performance from InP Gunn devices at these frequencies. This improvement in performance is attributed in part to a processing technique based on the use of etch-stop layers and InGaAs cap layers. An etch-stop layer allows low-profile mesas (2-3 [mu]m) and InGaAs cap layers help reduce the contact resistance, thus minimizing series resistances in the device. In addition, a physical model based on the Monte Carlo method was developed to aid in the design of structures for high frequency operation. Experimental results obtained from a 1.7 [mu]m Gunn device operating at W-band frequencies were used to estimate appropriate InP material parameters.