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Synthesis and characterization of silicon nitride whiskers
Wang, Ming-Jong; Wada, Harue
1990-03
Citation:Wang, Ming-Jong; Wada, Harue; (1990). "Synthesis and characterization of silicon nitride whiskers." Journal of Materials Science 25 (3): 1690-1698. <http://hdl.handle.net/2027.42/44697>
Abstract: Silicon nitride whiskers were synthesized by the carbothermal reduction of silica under nitrogen gas flow. The formation of silicon nitride whiskers occurs through a gas-phase reaction, 3SiO(g)+3CO(g)+2N 2 (g)=Si 3 N 4 ( β )+3CO 2 (g), and the VS mechanism. The generation of SiO gas was enhanced by the application of a halide bath. Various nitrogen flow rates resulted in different whisker yields and morphologies. A suitable gas composition range of N 2 , SiO and O 2 is necessary to make silicon nitride stable and grow in a whisker form. The oxygen partial pressure of the gas phase was measured by an oxygen sensor and the gas phase was analysed for CO/CO 2 by gas chromatography. Silicon nitride was first formed as a granule, typically a polycrystalline, and then grown as a single crystal whisker from the {1 0 0} plane of the granule along the 〈 210 〉 direction. The whiskers were identified as β ′-sialon with Z value ranging from 0.8 to 1.1, determined by lattice parameter measurements.