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Deposition and Properties of Superconducting MgB 2 Thin Films
Pogrebnyakov, A. V.; Xi, X. X.; Schlom, D. G.; Lettieri, J.; Redwing, J. M.; Liu, Zi-Kui; Brubaker, C. O.; Zhong, Y.; Wertz, E.; Xu, S. Y.; Hu, Y. F.; Zeng, X. H.; Soukiassian, A.; Li, Q.; Lysczek, E. M.; Tian, W.; Sun, H. P.; Pan, X. Q.
2003-10
Citation:Xi, X. X.; Zeng, X. H.; Pogrebnyakov, A. V.; Soukiassian, A.; Xu, S. Y.; Hu, Y. F.; Wertz, E.; Li, Q.; Zhong, Y.; Brubaker, C. O.; Liu, Z.-K.; Lysczek, E. M.; Redwing, J. M.; Lettieri, J.; Schlom, D. G.; Tian, W.; Sun, H. P.; Pan, X. Q.; (2003). "Deposition and Properties of Superconducting MgB 2 Thin Films." Journal of Superconductivity: Incorporating Novel Magnetism 16 (5): 801-806. <http://hdl.handle.net/2027.42/45120>
Abstract: The recently discovered superconductor MgB 2 with T c at 39 K has great potential in superconducting electronics. In this paper, we review the deposition techniques used for MgB 2 thin films in the light of a thermodynamic study of the Mg-B system with the calculation of phase diagrams (CALPHAD) modeling technique. This thermodynamic study identifies a growth window in the pressure–temperature phase diagram, in which the magnesium pressure is very high for likely in situ growth temperatures. A Hybrid Physical–Chemical Vapor Deposition (HPCVD) technique that successfully achieves such a high Mg pressure is shown to produce in situ epitaxial MgB 2 thin films with bulk superconducting properties.