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Electron-interface phonon interaction in multiple quantum well structures

dc.contributor.authorSun, J. P.en_US
dc.contributor.authorTeng, H. B.en_US
dc.contributor.authorHaddad, George I.en_US
dc.contributor.authorStroscio, Michael A.en_US
dc.date.accessioned2006-12-19T19:00:27Z
dc.date.available2006-12-19T19:00:27Z
dc.date.issued1998-08-01en_US
dc.identifier.citationSun, J P; Teng, H B; Haddad, G I; Stroscio, M A (1998). "Electron-interface phonon interaction in multiple quantum well structures ." Semiconductor Science and Technology. 13(8A): A147-A151. <http://hdl.handle.net/2027.42/48932>en_US
dc.identifier.issn0268-1242en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/48932
dc.description.abstractIntersubband relaxation rates due to electron interactions with the interface phonons are evaluated for multiple quantum well structures designed for step quantum well lasers operating at mid-infrared to submillimetre wavelengths. The interface phonon modes and electron-phonon interaction Hamiltonians for the structures are derived using the transfer matrix method, based on the macroscopic dielectric continuum model, whereas the electron wavefunctions are obtained by solving the Schrödinger equation. Fermi's golden rule is employed to calculate the electron relaxation rates between the subbands in these structures. The relaxation rates for two different structures are examined and compared with those calculated using the bulk phonon modes and the Fröhlich interaction Hamiltonian. The sum rule for the relationship between the form factors of the various localized phonon modes and the bulk phonon modes is verified. The results obtained in this work illustrate that the transfer matrix method provides a convenient way for deriving the properties of the interface phonon modes in different structures of current interest and that, for preferential electron relaxation in intersubband laser structures, the effects of the interface phonon modes are significant and should be considered for optimal design of these laser structures.en_US
dc.format.extent3118 bytes
dc.format.extent145690 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.language.isoen_US
dc.publisherIOP Publishing Ltden_US
dc.titleElectron-interface phonon interaction in multiple quantum well structuresen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumCenter for High Frequency Microelectronics, Solid State Electronics Laboratory, Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, MI 48109-2122, USAen_US
dc.contributor.affiliationumCenter for High Frequency Microelectronics, Solid State Electronics Laboratory, Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, MI 48109-2122, USAen_US
dc.contributor.affiliationumCenter for High Frequency Microelectronics, Solid State Electronics Laboratory, Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, MI 48109-2122, USAen_US
dc.contributor.affiliationotherUS Army Research Office, PO Box 12211, Research Triangle Park, NC 27709-2211, USAen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/48932/2/s80h41.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1088/0268-1242/13/8A/042en_US
dc.identifier.sourceSemiconductor Science and Technology.en_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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