Future directions of positron annihilation spectroscopy in low-k dielectric films
dc.contributor.author | Gidley, David W. | en_US |
dc.contributor.author | Vallery, Richard S. | en_US |
dc.contributor.author | Liu, M. | en_US |
dc.contributor.author | Peng, Huagen | en_US |
dc.date.accessioned | 2007-09-20T19:15:08Z | |
dc.date.available | 2008-09-08T14:25:13Z | en_US |
dc.date.issued | 2007-09 | en_US |
dc.identifier.citation | Gidley, D. W.; Vallery, R. S.; Liu, M.; Peng, H.-G. (2007)."Future directions of positron annihilation spectroscopy in low-k dielectric films." physica status solidi c 4(9): 3796-3803. <http://hdl.handle.net/2027.42/56172> | en_US |
dc.identifier.issn | 1610-1634 | en_US |
dc.identifier.issn | 1610-1642 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/56172 | |
dc.description.abstract | Positronium Annihilation Lifetime Spectroscopy (PALS) has become recognized in the microelectronics industry as one of only several methods capable of quantitatively characterizing engineered nanopores in next-generation (k < 2.2) interlayer dielectric (ILD) thin films. Successes and shortcomings of PALS to date will be assessed and compared with other methods of porosimetry such as ellipsometric and X-ray porosimetries (EP and XRP). A major theme in future low-k research focuses on the ability to integrate porous ILD's into chip fabrication; the vulnerability of porous dielectrics to etching, ashing, and chemical-mechanical polishing in process integration is delaying the introduction of ultra-low-k films. As device size approaches 45 nm the need to probe very small (sub-nanometer), semi-isolated pores beneath thin diffusion barriers is even more challenging. Depth-profiled PALS with its ability to determine a quantitative pore interconnection length and easily resolve 0.3 nm pores beneath diffusion barriers or in trench-patterned dielectrics should have a bright future in porous ILD research. The ability of PALS (and PAS in general) to deduce evolution and growth of pores with porosity should find broad applicability in the emerging field of high performance materials with strategically engineered nanopores. (© 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim) | en_US |
dc.format.extent | 1642479 bytes | |
dc.format.extent | 3118 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.publisher | WILEY-VCH Verlag | en_US |
dc.subject.other | Physics | en_US |
dc.title | Future directions of positron annihilation spectroscopy in low-k dielectric films | en_US |
dc.type | Article | en_US |
dc.rights.robots | IndexNoFollow | en_US |
dc.subject.hlbsecondlevel | Electrical Engineering and Computer Science | en_US |
dc.subject.hlbsecondlevel | Materials Science and Engineering | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Engineering | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Physics, University of Michigan, Ann Arbor, MI 48109, USA ; Phone: 734 936 1134, Fax: 734 764 5153 | en_US |
dc.contributor.affiliationum | Department of Physics, University of Michigan, Ann Arbor, MI 48109, USA | en_US |
dc.contributor.affiliationum | Department of Physics, University of Michigan, Ann Arbor, MI 48109, USA | en_US |
dc.contributor.affiliationum | Department of Physics, University of Michigan, Ann Arbor, MI 48109, USA | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/56172/1/3796_ftp.pdf | en_US |
dc.identifier.doi | http://dx.doi.org/10.1002/pssc.200675761 | en_US |
dc.identifier.source | physica status solidi c | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
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