Self-Sealing of Nanoporous Low Dielectric Constant Patterns Fabricated by Nanoimprint Lithography

Ro, Hyun Wook; Peng, Huagen; Niihara, Ken-ichi; Lee, Hae-Jeong; Lin, Eric K.; Karim, Alamgir; Gidley, David W.; Jinnai, Hiroshi; Yoon, Do Y.; Soles, Christopher L.

2008-05-19

Citation: Ro, Hyun Wook; Peng, Huagen; Niihara, Ken-ichi; Lee, Hae-Jeong; Lin, Eric K.; Karim, Alamgir; Gidley, David W.; Jinnai, Hiroshi; Yoon, Do Y.; Soles, Christopher L. (2008). "Self-Sealing of Nanoporous Low Dielectric Constant Patterns Fabricated by Nanoimprint Lithography Official contribution of the National Institute of Standards and Technology; not subject to copyright in the United States. This work is supported in part by NIST Office of Microelectronic Program, University of Michigan, the System IC 2010 Project of Korea, and the Chemistry and Molecular Engineering Program of Brain Korea 21 Project. We also acknowledge the Nanofabrication Laboratory of the Center for Nanoscale Science and Technology (CNST) in NIST for providing facilities for the NIL process. ." Advanced Materials 20(10): 1934-1939. <http://hdl.handle.net/2027.42/58644>

Abstract: No Abstract.

ISSN: 0935-9648, 1521-4095

DOIs: http://dx.doi.org/10.1002/adma.200701994

Handle: http://hdl.handle.net/2027.42/58644

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