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Microstructure and electrical properties of p-type phosphorus-doped ZnO films

dc.contributor.authorAllenic, Arnold L.en_US
dc.contributor.authorGuo, W.en_US
dc.contributor.authorChen, Y. B.en_US
dc.contributor.authorChe, Y.en_US
dc.contributor.authorHu, Z. D.en_US
dc.contributor.authorLiu, Bingen_US
dc.contributor.authorPan, Xiaoqingen_US
dc.date.accessioned2009-10-08T15:33:05Z
dc.date.available2009-10-08T15:33:05Z
dc.date.issued2008en_US
dc.identifier.citationAllenic, A; Guo, W; Chen, Y B; Che, Y; Hu, Z D; Liu, B; Pan, X Q (2008). "Microstructure and electrical properties of p-type phosphorus-doped ZnO films." Journal of Physics D: Applied Physics 41(2):025103 (6pp). <http://hdl.handle.net/2027.42/64183>en_US
dc.identifier.issn0022-3727en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/64183
dc.description.abstract"The microscopic defects and their effects on the electrical properties of phosphorus-doped ZnO films epitaxially grown on (0 0 0 1) sapphire and ZnO substrates by pulsed laser deposition are studied. While threading dislocations were observed only in heteroepitaxial films, a high density of partial dislocations associated with interstitial dislocation loops was observed in films grown on both substrates. These dislocations provide sinks to quench native donors and favour the injection of zinc vacancies to form acceptor-complex defects, thus leading to p-type conductivity."en_US
dc.format.extent651797 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.titleMicrostructure and electrical properties of p-type phosphorus-doped ZnO filmsen_US
dc.typeArticleen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/64183/1/d8_2_025103.pdf
dc.identifier.doihttp://dx.doi.org/10.1088/0022-3727/41/2/025103en_US
dc.identifier.sourceJournal of Physics D: Applied Physicsen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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