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Amorphous alloys formed by microsecond current pulses

dc.contributor.authorClemens, Bruce M.en_US
dc.contributor.authorGilgenbach, Ronald M.en_US
dc.contributor.authorBidwell, S.W.en_US
dc.date.accessioned2010-05-06T20:55:15Z
dc.date.available2010-05-06T20:55:15Z
dc.date.issued1987-03-02en_US
dc.identifier.citationClemens, B. M.; Gilgenbach, R. M.; Bidwell, S. (1987). "Amorphous alloys formed by microsecond current pulses." Applied Physics Letters 50(9): 495-497. <http://hdl.handle.net/2027.42/69645>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/69645
dc.description.abstractWe report the use of microsecond current pulses to transform layered crystalline nickel‐zirconium films to amorphous alloy. Starting material was electron beam deposited multilayers with a composition modulation wavelength of 34 nm, an average composition of Ni63Zr37, and a total thickness of 680 nm. Electrical pulses were approximately rectangular and about 3 μs in duration, with an intensity of several hundred amperes, directly coupling 1.6 to 3 J of energy uniformly into the film. By monitoring current and voltage, the reaction and melting of the sample were observed, and the total energy of the pulse was easily computed. A sharp threshold in pulse energy for sample transformation was observed. A simple heat flow calculation demonstrated that the chemical energy released by the reaction, and the change in diffusion kinetics as the sample temperature exceeded the glass transition temperature of the amorphous alloy, are responsible for this sudden onset. The maximum temperature estimated from this calculation is below the melting point of the constituents, and the cooling rate is 107–108 K/s which is in agreement with the formation of amorphous alloy.en_US
dc.format.extent3102 bytes
dc.format.extent366606 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleAmorphous alloys formed by microsecond current pulsesen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumPhysics Department, General Motors Research, Warren, Michigan 48090‐9055en_US
dc.contributor.affiliationumNuclear Engineering Department, The University of Michigan, Ann Arbor, Michigan 48109en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/69645/2/APPLAB-50-9-495-1.pdf
dc.identifier.doi10.1063/1.98184en_US
dc.identifier.sourceApplied Physics Lettersen_US
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dc.owningcollnamePhysics, Department of


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