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Ionization and ablation phenomena in an ablative plasma accelerator

dc.contributor.authorKeidar, Michaelen_US
dc.contributor.authorBoyd, Iain D.en_US
dc.contributor.authorBeilis, Isak I.en_US
dc.date.accessioned2010-05-06T21:11:03Z
dc.date.available2010-05-06T21:11:03Z
dc.date.issued2004-11-15en_US
dc.identifier.citationKeidar, M.; Boyd, I. D.; Beilis, I. I. (2004). "Ionization and ablation phenomena in an ablative plasma accelerator." Journal of Applied Physics 96(10): 5420-5428. <http://hdl.handle.net/2027.42/69809>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/69809
dc.description.abstractSeveral interrelated phenomena near the surface ablated into a discharge plasma, such as ablation and ionization in accelerated plasma are studied. Two characteristic ablation modes are identified, namely, ablation mode with a velocity at the Knudsen layer edge smaller than the local sound speed and a velocity at the Knudsen layer edge close to the sound speed. The existence of these two ablation modes is determined by the current density in the acceleration region. The nonequilibrium ionization region in the presence of strong electromagnetic plasma acceleration is studied. In the subsonic regime, the ionization region thickness is proportional to the ionization rate and inversely proportional to the magnetic field. Conditions for ionization equilibrium in the accelerating plasma are determined. The specific example of a micropulsed plasma thruster is considered. It is concluded that both the equilibrium and nonequilibrium ionization regimes occur in this device.en_US
dc.format.extent3102 bytes
dc.format.extent167969 bytes
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dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleIonization and ablation phenomena in an ablative plasma acceleratoren_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Aerospace Engineering, University of Michigan, Ann Arbor, Michigan 48109en_US
dc.contributor.affiliationotherElectrical Discharge and Plasma Laboratory, Tel Aviv University, Tel Aviv, P. O. Box 39040, Tel Aviv 69978, Israelen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/69809/2/JAPIAU-96-10-5420-1.pdf
dc.identifier.doi10.1063/1.1805726en_US
dc.identifier.sourceJournal of Applied Physicsen_US
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dc.owningcollnamePhysics, Department of


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