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Nanodomains of pyrochlore formed by Ti ion implantation in yttria-stabilized zirconia

dc.contributor.authorZhu, S.en_US
dc.contributor.authorZu, X. T.en_US
dc.contributor.authorWang, L. M.en_US
dc.contributor.authorEwing, Rodney C.en_US
dc.date.accessioned2010-05-06T21:35:24Z
dc.date.available2010-05-06T21:35:24Z
dc.date.issued2002-06-10en_US
dc.identifier.citationZhu, S.; Zu, X. T.; Wang, L. M.; Ewing, R. C. (2002). "Nanodomains of pyrochlore formed by Ti ion implantation in yttria-stabilized zirconia." Applied Physics Letters 80(23): 4327-4329. <http://hdl.handle.net/2027.42/70072>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/70072
dc.description.abstractThe microstructural evolution of a single crystal of yttria-stabilized zirconia (YSZ) implanted with Ti has been studied by cross-sectional transmission electron microscopy (TEM). The implantation of 180 keV Ti ions to a dose of 1×1017 ions/cm21×1017ions/cm2 was completed at room temperature. After annealing at 1100 °C in an Ar atmosphere for 2 h, a phase transition from the fluorite structure of ZrO2ZrO2 to an isometric pyrochlore structure-type, A2B2O7,A2B2O7, occurred due to cation ordering. High-resolution TEM revealed nanodomains of pyrochlore, Y2(TixZr1−x)2O7,Y2(TixZr1−x)2O7, with a ≅ 10.24±0.05 Å.a≅10.24±0.05Å. The nanodomains of the pyrochlore phase, embedded within the YSZ fluorite substrate, occurred in a depth range from 45 to 105 nm below the surface, which corresponds to Ti concentrations from ∼10 to ∼15 at. %. The nanoscale pyrochlore precipitates and the YSZ matrix have a completely coherent orientation. © 2002 American Institute of Physics.en_US
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dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleNanodomains of pyrochlore formed by Ti ion implantation in yttria-stabilized zirconiaen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Nuclear Engineering and Radiological Sciences, University of Michigan, Ann Arbor, Michigan 48109-2104en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/70072/2/APPLAB-80-23-4327-1.pdf
dc.identifier.doi10.1063/1.1482784en_US
dc.identifier.sourceApplied Physics Lettersen_US
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dc.owningcollnamePhysics, Department of


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