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Molecular beam epitaxial growth and photoluminescence of near‐ideal GaAs‐AlxGa1−xAs single quantum wells

dc.contributor.authorJuang, Feng-Yuhen_US
dc.contributor.authorNashimoto, Yasunobuen_US
dc.contributor.authorBhattacharya, Pallab K.en_US
dc.date.accessioned2010-05-06T22:04:13Z
dc.date.available2010-05-06T22:04:13Z
dc.date.issued1985-09-01en_US
dc.identifier.citationJuang, F.‐Y.; Nashimoto, Yasunobu; Bhattacharya, Pallab K. (1985). "Molecular beam epitaxial growth and photoluminescence of near‐ideal GaAs‐AlxGa1−xAs single quantum wells." Journal of Applied Physics 58(5): 1986-1989. <http://hdl.handle.net/2027.42/70380>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/70380
dc.description.abstractSingle quantum wells with ∼120‐Å GaAs wells and Al0.3Ga0.7As or GaAs‐Al0.3Ga0.7As superlattice barriers were grown by molecular beam epitaxy under conditions known to produce very high‐purity material. Low‐temperature photoluminescence measurements indicate that the dominant recombination transitions are associated with free and bound excitons involving both light and heavy holes. A forbidden transition, possibly E21h, is also observed. The transition associated with electron‐heavy‐hole free excitons is most intense and has a linewidth of 0.3 meV at 2 K. The linewidths observed for these samples, grown with As4 species at 630 °C, are the smallest for 120‐Å single quantum wells and are close to theoretically calculated limits.en_US
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dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleMolecular beam epitaxial growth and photoluminescence of near‐ideal GaAs‐AlxGa1−xAs single quantum wellsen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumSolid State Electronics Laboratory, Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/70380/2/JAPIAU-58-5-1986-1.pdf
dc.identifier.doi10.1063/1.336007en_US
dc.identifier.sourceJournal of Applied Physicsen_US
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dc.owningcollnamePhysics, Department of


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