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Monte Carlo Simulation of the Low‐Voltage Arc Mode in Plasma Diodes

dc.contributor.authorSalinger, S. N.en_US
dc.contributor.authorRowe, J. E. (Joseph Everett)en_US
dc.date.accessioned2010-05-06T22:15:55Z
dc.date.available2010-05-06T22:15:55Z
dc.date.issued1968-07en_US
dc.identifier.citationSalinger, S. N.; Rowe, J. E. (1968). "Monte Carlo Simulation of the Low‐Voltage Arc Mode in Plasma Diodes." Journal of Applied Physics 39(8): 3933-3944. <http://hdl.handle.net/2027.42/70504>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/70504
dc.description.abstractA statistical simulation of the low‐voltage arc mode of plasma diodes is carried out on a large‐scale digital computer to ascertain the importance of various thermalization and transport mechanisms. The computer experiment is two‐dimensional and utilizes Monte Carlo techniques to study the low‐voltage arc in neon at p=2 Torr, current=4 A, and diode spacing=2.37 cm. Results on the potential distribution, electron‐density distribution, and electron‐energy density function are presented and discussed. The theoretical results are correlated with experimental results.en_US
dc.format.extent3102 bytes
dc.format.extent1090501 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleMonte Carlo Simulation of the Low‐Voltage Arc Mode in Plasma Diodesen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumElectron Physics Laboratory, Department of Electrical Engineering, The University of Michigan, Ann Arbor, Michiganen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/70504/2/JAPIAU-39-8-3933-1.pdf
dc.identifier.doi10.1063/1.1656878en_US
dc.identifier.sourceJournal of Applied Physicsen_US
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dc.owningcollnamePhysics, Department of


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