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Relative fluorine concentrations in radio frequency/electron cyclotron resonance hybrid glow discharges

dc.contributor.authorPassow, Michael L.en_US
dc.contributor.authorPender, J. T. P.en_US
dc.contributor.authorBrake, Mary L.en_US
dc.contributor.authorSung, K. T.en_US
dc.contributor.authorLiu, Y.en_US
dc.contributor.authorPang, S. W.en_US
dc.contributor.authorElta, Michael E.en_US
dc.date.accessioned2010-05-06T22:53:26Z
dc.date.available2010-05-06T22:53:26Z
dc.date.issued1992-02-17en_US
dc.identifier.citationPassow, M. L.; Pender, J. T. P.; Brake, M. L.; Sung, K. T.; Liu, Y.; Pang, S. W.; Elta, M. E. (1992). "Relative fluorine concentrations in radio frequency/electron cyclotron resonance hybrid glow discharges." Applied Physics Letters 60(7): 818-820. <http://hdl.handle.net/2027.42/70900>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/70900
dc.description.abstractThe relative concentration of atomic fluorine was measured in a radio frequency (rf) glow discharge and a modified electron cyclotron resonance microwave/rf hybrid discharge in CF4 using an actinometric technique. The dependence of fluorine concentration on rf and microwave power, pressure, flow, and excitation source are presented. Anomalous behavior with rf power at constant microwave power was observed when using the Ar 750‐nm line as the actinometric species.en_US
dc.format.extent3102 bytes
dc.format.extent360871 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleRelative fluorine concentrations in radio frequency/electron cyclotron resonance hybrid glow dischargesen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Nuclear Engineering, The University of Michigan, Ann Arbor, Michigan 48109‐2104en_US
dc.contributor.affiliationumSolid State Electronics Laboratory, Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109‐2122en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/70900/2/APPLAB-60-7-818-1.pdf
dc.identifier.doi10.1063/1.107428en_US
dc.identifier.sourceApplied Physics Lettersen_US
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dc.identifier.citedreferenceM. L. Passow, Ph.D. thesis, University of Michigan, 1991.en_US
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dc.owningcollnamePhysics, Department of


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