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Ultraviolet emission of silicon quantum tips

dc.contributor.authorZheng, W. H.en_US
dc.contributor.authorXia, Jian-baien_US
dc.contributor.authorLam, S. D.en_US
dc.contributor.authorCheah, K. W.en_US
dc.contributor.authorRakhshandehroo, M. R.en_US
dc.contributor.authorPang, S. W.en_US
dc.date.accessioned2010-05-06T23:12:24Z
dc.date.available2010-05-06T23:12:24Z
dc.date.issued1999-01-18en_US
dc.identifier.citationZheng, W. H.; Xia, Jian-bai; Lam, S. D.; Cheah, K. W.; Rakhshandehroo, M. R.; Pang, S. W. (1999). "Ultraviolet emission of silicon quantum tips." Applied Physics Letters 74(3): 386-388. <http://hdl.handle.net/2027.42/71101>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/71101
dc.description.abstractSilicon tips used as field emitters have dimensions that are within the quantum confinement regime. Therefore they can be considered as freestanding silicon tips. In this letter, a photoluminescence spectrum of a 100×100100×100 array of silicon tips was taken at 10 K. Narrow ultraviolet luminescence peaks were observed. Using the empirical pseudopotential homojunction model, it is demonstrated that these luminescence peaks come from energy levels arising from quantum confinement. By fitting the theoretical result to the experimental result, we conclude that the luminescence peaks come from Si quantum tips of about 20 Å in width and that they are covered by silicon dioxide. © 1999 American Institute of Physics.en_US
dc.format.extent3102 bytes
dc.format.extent163855 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleUltraviolet emission of silicon quantum tipsen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109-2122en_US
dc.contributor.affiliationotherDepartment of Physics, Hong Kong Baptist University, Kowloon Tong, Hong Kong, People’s Republic of Chinaen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/71101/2/APPLAB-74-3-386-1.pdf
dc.identifier.doi10.1063/1.123079en_US
dc.identifier.sourceApplied Physics Lettersen_US
dc.identifier.citedreferenceL. T. Canham, Appl. Phys. Lett. APPLAB57, 1046 (1990).en_US
dc.identifier.citedreferenceSee, for example, Mater. Res. Soc. Symp. Proc. 256 (1992); 283 (1993); 358 (1995); 452 (1997).en_US
dc.identifier.citedreferenceK. Kim, Phys. Rev. B PRBMDO57, 13072 (1998).en_US
dc.identifier.citedreferenceM. Rakhshandehroo and S. W. Pang, J. Vac. Sci. Technol. B JVTBD914, 3697 (1996).en_US
dc.identifier.citedreferenceM. R. Rakhshandehroo and S. W. Pang, J. Vac. Sci. Technol. B JVTBD915, 2777 (1997).en_US
dc.identifier.citedreferenceJ. B. Xia and K. W. Cheah, Phys. Rev. B PRBMDO55, 15688 (1997).en_US
dc.identifier.citedreferenceP. Balk, The Si–SiO2Si–SiO2 System (Elsevier, Amsterdam, 1988).en_US
dc.identifier.citedreferenceS. L. Zhang, K. S. Ho, Y. T. Hou, B. D. Qian, P. Diao, and S. M. Cai, Appl. Phys. Lett. APPLAB62, 642 (1993).en_US
dc.identifier.citedreferenceX. Wang, D. M. Huang, L. Ye, M. Yang, P. H. Hao, H. X. Fu, X. Y. Hou, and X. D. Xie, Phys. Rev. Lett. PRLTAO71, 1265 (1993).en_US
dc.identifier.citedreferenceH. Benisty, C. M. Sotomayor-Torres, and C. Weisbuch, Phys. Rev. B PRBMDO44, 10945 (1991).en_US
dc.identifier.citedreferenceH. Sakaki, Jpn. J. Appl. Phys., Part 2 JAPLD819, L735 (1980).en_US
dc.owningcollnamePhysics, Department of


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