Limiting current in a relativistic diode under the condition of magnetic insulation
dc.contributor.author | Lopez, Mike R. | en_US |
dc.contributor.author | Lau, Y. Y. | en_US |
dc.contributor.author | Luginsland, John W. | en_US |
dc.contributor.author | Jordan, David W. | en_US |
dc.contributor.author | Gilgenbach, Ronald M. | en_US |
dc.date.accessioned | 2010-05-06T23:16:30Z | |
dc.date.available | 2010-05-06T23:16:30Z | |
dc.date.issued | 2003-11 | en_US |
dc.identifier.citation | Lopez, Mike; Lau, Y. Y.; Luginsland, John W.; Jordan, David W.; Gilgenbach, Ronald M. (2003). "Limiting current in a relativistic diode under the condition of magnetic insulation." Physics of Plasmas 10(11): 4489-4493. <http://hdl.handle.net/2027.42/71144> | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/71144 | |
dc.description.abstract | The maximum emission current density is calculated for a time-independent, relativistic, cycloidal electron flow in a diode that is under the condition of magnetic insulation. Contrary to conventional thinking, this maximum current is not determined by the space charge limited condition on the cathode, even when the emission velocity of the electrons is assumed to be zero. The self electric and magnetic fields associated with the cycloidal flow are completely accounted for. This maximum current density is confirmed by a two-dimensional, fully electromagnetic and fully relativistic particle-in-cell code. © 2003 American Institute of Physics. | en_US |
dc.format.extent | 3102 bytes | |
dc.format.extent | 191318 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.publisher | The American Institute of Physics | en_US |
dc.rights | © The American Institute of Physics | en_US |
dc.title | Limiting current in a relativistic diode under the condition of magnetic insulation | en_US |
dc.type | Article | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Nuclear Engineering and Radiological Sciences, University of Michigan, Ann Arbor, Michigan 48109-2104 | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/71144/2/PHPAEN-10-11-4489-1.pdf | |
dc.identifier.doi | 10.1063/1.1613654 | en_US |
dc.identifier.source | Physics of Plasmas | en_US |
dc.identifier.citedreference | A. Ron, A. A. Mondelli, and N. Rostoker, IEEE Trans. Plasma Sci. ITPSBDPS-1, 85 (1973). | en_US |
dc.identifier.citedreference | R. V. Lovelace and E. Ott, Phys. Fluids PFLDAS17, 1263 (1974). | en_US |
dc.identifier.citedreference | P. J. Christenson, Ph.D. dissertation, University of Michigan, Ann Arbor (1996). | en_US |
dc.identifier.citedreference | J. A. Swegle, IEEE Trans. Plasma Sci. ITPSBDPS-24, 1277 (1996); Phys. Fluids PFLDAS25, 1282 (1982); 26, 1670 (1983). | en_US |
dc.identifier.citedreference | J. A. Swegle and E. Ott, Phys. Fluids PFLDAS24, 1821 (1981). | en_US |
dc.identifier.citedreference | E. Ott and R. V. Lovelace, Appl. Phys. Lett. APPLAB27, 378 (1975). | en_US |
dc.identifier.citedreference | M. P. Desjarlais and R. N. Sudan, Phys. Fluids PFLDAS29, 1746 (1986); 29, 1245 (1986); 30, 1536 (1987). | en_US |
dc.identifier.citedreference | K. D. Bergeron, Appl. Phys. Lett. APPLAB28, 306 (1976). | en_US |
dc.identifier.citedreference | C. W. Mendel, J. Appl. Phys. JAPIAU50, 3830 (1979). | en_US |
dc.identifier.citedreference | P. A. Miller and C. W. Mendel, Jr., J. Appl. Phys. JAPIAU61, 529 (1987). | en_US |
dc.identifier.citedreference | C. W. Mendel, D. B. Seidel, and S. A. Slutz, Phys. Fluids PFLDAS26, 3628 (1983); C. W. Mendel, S. E. Rosenthal, and D. B. Seidel, Phys. Rev. A PLRAAN45, 5854 (1992). | en_US |
dc.identifier.citedreference | N. A. Krall and S. E. Rosenthal, J. Appl. Phys. JAPIAU70, 2542 (1991). | en_US |
dc.identifier.citedreference | J. M. Creedon, J. Appl. Phys. JAPIAU48, 1070 (1977). | en_US |
dc.identifier.citedreference | T. R. Lockner and J. W. Poukey, J. Appl. Phys. JAPIAU57, 2652 (1985). | en_US |
dc.identifier.citedreference | P. A. Lindsay and R. S. Goodell, J. Appl. Phys. JAPIAU36, 411 (1965). | en_US |
dc.identifier.citedreference | T. J. Orzechowski and G. Bekefi, Phys. Fluids PFLDAS19, 43 (1976); 22, 978 (1979). | en_US |
dc.identifier.citedreference | J. P. Verboncoeur and C. K. Birdsall, Phys. Plasmas PHPAEN3, 712 (1996). | en_US |
dc.identifier.citedreference | V. P. Gopinath, J. P. Verboncoeur, and C. K. Birdsall, Phys. Plasmas PHPAEN3, 2766 (1996); V. P. Gopinath and B. H. Vandenberg, 5, 261 (1998). | en_US |
dc.identifier.citedreference | B. W. Church and R. N. Sudan, Phys. Plasmas PHPAEN3, 3809 (1996). | en_US |
dc.identifier.citedreference | C. K. Birdsall and W. B. Bridges, Electron Dynamics of Diode Regions (Academic, New York, 1966). | en_US |
dc.identifier.citedreference | R. B. Miller, An Introduction to the Physics of Intense Charged Particle Beams (Plenum, New York, 1982), Sec. 3.3.4. | en_US |
dc.identifier.citedreference | R. C. Davidson, Physics of Nonneutral Plasmas (Addison-Wesley, Redwood City, CA, 1990). | en_US |
dc.identifier.citedreference | J. P. Verboncoeur, M. V. Alves, V. Vahedi, and C. K. Birdsall, J. Comput. Phys. JCTPAH104, 321 (1993). | en_US |
dc.identifier.citedreference | H. R. Jory and A. W. Trivelpiece, J. Appl. Phys. JAPIAU40, 3924 (1969). | en_US |
dc.identifier.citedreference | B. Goplan, L. Ludeking, D. Smithe, and G. Warren, Comput. Phys. Commun. CPHCBZ87, 54 (1995). | en_US |
dc.identifier.citedreference | P. J. Christenson and Y. Y. Lau, Phys. Rev. Lett. PRLTAO76, 3324 (1996). | en_US |
dc.identifier.citedreference | P. J. Christenson, D. P. Chernin, A. L. Garner, and Y. Y. Lau, Phys. Plasmas PHPAEN3, 4455 (1996). | en_US |
dc.identifier.citedreference | A. L. Garner, Y. Y. Lau, and D. Chernin, Phys. Plasmas PHPAEN5, 2447 (1998). | en_US |
dc.identifier.citedreference | J. C. Slater, Microwave Electronics (Van Nostrand, New York, 1950), Chap. 13. | en_US |
dc.identifier.citedreference | O. Buneman, in Crossed-Field Microwave Devices, edited by E. Okress (Academic, New York, 1961), Vol. 1, p. 209. | en_US |
dc.identifier.citedreference | H. L. McDowell, IEEE Trans. Plasma Sci. ITPSBD30, 980 (2002). | en_US |
dc.identifier.citedreference | T. M. Antonsen, Jr. and E. Ott, Phys. Fluids PFLDAS19, 52 (1976). | en_US |
dc.identifier.citedreference | T. M. Antonsen, Jr., E. Ott, C. L. Chang, and A. T. Drobot, Phys. Fluids PFLDAS28, 2878 (1985). | en_US |
dc.identifier.citedreference | A. Valfells, D. W. Feldman, M. Virgo, P. G. O’Shea, and Y. Y. Lau, Phys. Plasmas PHPAEN9, 2377 (2002). | en_US |
dc.identifier.citedreference | M. C. Clark, B. M. Marder, and L. D. Bacon, Appl. Phys. Lett. APPLAB52, 78 (1988). | en_US |
dc.identifier.citedreference | R. W. Lemke and M. C. Clark, J. Appl. Phys. JAPIAU62, 3436 (1987). | en_US |
dc.identifier.citedreference | M. D. Haworth, G. Baca, J. Benford et al., IEEE Trans. Plasma Sci. ITPSBD26, 312 (1998); K. J. Hendricks, J. Benford, J. Eastwood, M. Friedman, M. Haworth, R. W. Lemke, J. W. Luginsland, R. B. Miller, and J. Pasour, in High-Power Microwave Sources and Technologies, edited by R. J. Barker and E. Schamiloglu (IEEE, Piscataway, NJ, 2001), Chap. 3. | en_US |
dc.identifier.citedreference | D. Shiffler, G. Baca, T. Englert et al., IEEE Trans. Plasma Sci. ITPSBD26, 304 (1998). | en_US |
dc.identifier.citedreference | F. J. Agee, W. L. Baker, and J. A. Gaudet, in High-Power Microwave Sources and Technologies, edited by R. J. Barker and E. Schamiloglu (IEEE, Piscataway, NJ, 2001), Chap. 2. | en_US |
dc.identifier.citedreference | Y. Y. Lau, P. J. Christenson, and D. P. Chernin, Phys. Fluids B PFBPEI5, 4486 (1993). | en_US |
dc.identifier.citedreference | J. W. Luginsland, Y. Y. Lau, R. J. Umstattd, and J. J. Watrous, Phys. Plasmas PHPAEN9, 2371 (2002); R. J. Umstattd and J. W. Luginsland, Phys. Rev. Lett. PRLTAO87, 145002 (2001). | en_US |
dc.identifier.citedreference | J. W. Luginsland, Y. Y. Lau, and R. M. Gilgenbach, Phys. Rev. Lett. PRLTAO77, 4668 (1996); Y. Y. Lau, 87, 278301 (2001). | en_US |
dc.identifier.citedreference | F. Hegeler, M. Friedman, M. C. Myers, J. D. Sethian, and S. B. Swanekamp, Phys. Plasmas PHPAEN9, 4309 (2002). | en_US |
dc.owningcollname | Physics, Department of |
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