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Analysis of laser absorption on a rough metal surface

dc.contributor.authorAng, L. K.en_US
dc.contributor.authorLau, Y. Y.en_US
dc.contributor.authorGilgenbach, Ronald M.en_US
dc.contributor.authorSpindler, H. L.en_US
dc.date.accessioned2010-05-06T23:30:24Z
dc.date.available2010-05-06T23:30:24Z
dc.date.issued1997-02-10en_US
dc.identifier.citationAng, L. K.; Lau, Y. Y.; Gilgenbach, R. M.; Spindler, H. L. (1997). "Analysis of laser absorption on a rough metal surface." Applied Physics Letters 70(6): 696-698. <http://hdl.handle.net/2027.42/71289>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/71289
dc.description.abstractWe have developed a simple model to estimate the cumulative absorption coefficient of an ultraviolet laser pulse impinging on a pure metal, including the effects of surface roughness whose scale is much larger than the laser wavelength λ. The multiple reflections from the rough surface may increase the absorption coefficient over a pristine, flat surface by an order of magnitude. Thus, as much as 16% (at room temperature) of the power of a 248 nm KrF excimer laser pulse may be absorbed by an aluminum target. A comparison with experimental data is given. © 1997 American Institute of Physics.en_US
dc.format.extent3102 bytes
dc.format.extent94145 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleAnalysis of laser absorption on a rough metal surfaceen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Nuclear Engineering and Radiological Sciences, Intense Energy Beam Interaction Laboratory, The University of Michigan, Ann Arbor, Michigan 48109-2104en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/71289/2/APPLAB-70-6-696-1.pdf
dc.identifier.doi10.1063/1.118242en_US
dc.identifier.sourceApplied Physics Lettersen_US
dc.identifier.citedreferenceH. L. Spindler, R. M. Gilgenbach, and J. S. Lash, Appl. Phys. Lett. APPLABAIP68, 3245 (1996).en_US
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dc.identifier.citedreferenceSee, e.g., M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994); R. P. Feynman, Lectures on Physics (Addison-Wesley, Reading, MA, 1964), Vol. 2, pp. 32-10.en_US
dc.identifier.citedreferenceSee, e.g., Chap. 10 in C. Kittel, Introduction to Solid State Physics (Wiley, New York, 1976).en_US
dc.identifier.citedreferenceIf instead we calculate ωpωp by assuming that there is one free electron for each aluminum atom, as done in Feynamn [Ref. 10], we arrive at a similar value of ωp/ω = 1.82.ωp/ω=1.82. Feynman, in addition, suggested a method to evaluate Δ, with the result being given in Eq. (2) following his procedure. More serious are the effects of oxide layer and of polycrystallinity in the metal in the evaluation of Δ and ωp.ωp.en_US
dc.identifier.citedreferenceSee, e.g., Chap. 7.3 in J. D. Jackson, Classical Electrodynamics (Wiley, New York, 1990).en_US
dc.identifier.citedreferenceJ. F. Young, J. S. Preston, H. M. van Driel, and J. E. Sipe, Phys. Rev. B PRBMDOAIP27, 1155 (1983).en_US
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dc.identifier.citedreferenceT. E. Zavecz and M. A. Saifi, Appl. Phys. Lett. APPLABAIP26, 165 (1975).en_US
dc.owningcollnamePhysics, Department of


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