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Nonlinear optical response of GaN layers on sapphire: The impact of fundamental beam interference

dc.contributor.authorKravetsky, I. V.en_US
dc.contributor.authorTiginyanu, I. M.en_US
dc.contributor.authorHildebrandt, Ralfen_US
dc.contributor.authorMarowsky, Gerden_US
dc.contributor.authorPavlidis, Dimitrisen_US
dc.contributor.authorEisenbach, Andreasen_US
dc.contributor.authorHartnagel, Hans L.en_US
dc.date.accessioned2010-05-06T23:35:14Z
dc.date.available2010-05-06T23:35:14Z
dc.date.issued2000-02-14en_US
dc.identifier.citationKravetsky, I. V.; Tiginyanu, I. M.; Hildebrandt, Ralf; Marowsky, Gerd; Pavlidis, D.; Eisenbach, A.; Hartnagel, H. L. (2000). "Nonlinear optical response of GaN layers on sapphire: The impact of fundamental beam interference." Applied Physics Letters 76(7): 810-812. <http://hdl.handle.net/2027.42/71340>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/71340
dc.description.abstractGaN layers grown by metalorganic chemical-vapor deposition were characterized by optical second- and third-harmonic generation techniques. The angular dependence of the second-harmonic intensity in transmission showed a cc-textured growth of the GaN layers on the sapphire substrates. The measured ratios d33/d15d33/d15 and d33/d31d33/d31 are equal to −2.02−2.02 and −2.03,−2.03, respectively, which is indicative of a wurzite structure of the GaN layers. The measured d33d33 is 33 times that of the d11d11 of quartz. Fine oscillations were observed in the measured second- and third-harmonic angular dependencies that are explained by taking into account the interference of the fundamental beam in the GaN/sapphire structure. © 2000 American Institute of Physics.en_US
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dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleNonlinear optical response of GaN layers on sapphire: The impact of fundamental beam interferenceen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumSolid State Electronics Laboratory, The University of Michigan, Ann Arbor, Michigan 48109-2122en_US
dc.contributor.affiliationotherInstitute of Applied Physics, Technical University of Moldova, 2004 Chisinau, Moldovaen_US
dc.contributor.affiliationotherLaser-Laboratorium Göttingen e. V., Hans-Adolf-Krebs-Weg 1, D-37077 Göttingen, Germanyen_US
dc.contributor.affiliationotherInstitut für Hochfrequenztechnik, Technische Universität Darmstadt, D-64283 Darmstadt, Germanyen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/71340/2/APPLAB-76-7-810-1.pdf
dc.identifier.doi10.1063/1.125592en_US
dc.identifier.sourceApplied Physics Lettersen_US
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dc.owningcollnamePhysics, Department of


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