Maskless Photolithography System
dc.contributor.author | Hassan, Ahmad | |
dc.contributor.author | Langley, David | |
dc.contributor.author | Lapprich, Kevin | |
dc.contributor.author | Ludwig, Dustin | |
dc.contributor.advisor | Chronis, Nikos | |
dc.date.accessioned | 2011-09-12T00:03:53Z | |
dc.date.available | 2011-09-12T00:03:53Z | |
dc.date.issued | 2009-12 | |
dc.identifier.uri | https://hdl.handle.net/2027.42/86196 | |
dc.description | Final report for Project 02 of ME450, Winter 2009 semester. | en_US |
dc.description.abstract | Photolithography is a key process in the semiconductor industry (e.g. in the integrated circuit and MEMS industry) that is based on the use of expensive optical equipment (steppers) to pattern micron-size features on silicon wafers. The goal of the project is to manufacture an inexpensive, photolithographic system for photo-patterning submicron-resolution features. | en_US |
dc.description.sponsorship | Nikos Chronis (Mechanical Engineering, U of M) | en_US |
dc.language.iso | en_US | en_US |
dc.subject | ME450 | en_US |
dc.subject | F09 | en_US |
dc.subject | Maskless | en_US |
dc.subject | Photolithography | en_US |
dc.title | Maskless Photolithography System | en_US |
dc.type | Project | en_US |
dc.subject.hlbsecondlevel | Mechanical Engineering | |
dc.subject.hlbtoplevel | Engineering | |
dc.contributor.affiliationum | Students | en_US |
dc.contributor.affiliationumcampus | Ann Arbor | |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/86196/1/ME450 Fall2009 Final Report - Project 02 - Maskless Photolithography System.pdf | |
dc.owningcollname | Mechanical Engineering, Department of |
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