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Monte Carlo modeling of YBCO vapor deposition

dc.contributor.authorFan, Jingen_US
dc.contributor.authorBoyd, Iain D.en_US
dc.contributor.authorShelton, Chrisen_US
dc.date.accessioned2011-11-15T15:59:33Z
dc.date.available2011-11-15T15:59:33Z
dc.date.issued2001-08-30en_US
dc.identifier.citationFan, Jing; Boyd, Iain D.; Shelton, Chris (2001). "Monte Carlo modeling of YBCO vapor deposition." AIP Conference Proceedings 585(1): 214-221. <http://hdl.handle.net/2027.42/87371>en_US
dc.identifier.otherAPCPCS-585-1en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/87371
dc.description.abstractA three dimensional electron beam physical vapor deposition process of super-conducting films of YBa2Cu3O7−δYBa2Cu3O7−δ in a vacuum chamber is investigated both computationally and experimentally. The numerical analysis employs the direct simulation Monte Carlo (DSMC) method. Some important modeling issues such as atomic collision cross-sections for metal vapors and hyperfine electronic structure of the atomic absorption spectra are addressed. Film deposition thickness profiles and atomic absorption spectra given by the DSMC method and experiment for pure yttrium evaporation are in excellent agreement. Interaction between the vapor jets is found to have a significant effect on the film growth rate and species molar ratio that are key factors of the film technology. © 2001 American Institute of Physics.en_US
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleMonte Carlo modeling of YBCO vapor depositionen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/87371/2/214_1.pdf
dc.identifier.doi10.1063/1.1407565en_US
dc.identifier.sourceRAREFIED GAS DYNAMICS: 22nd International Symposiumen_US
dc.owningcollnamePhysics, Department of


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