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Single domain strain relaxed PrScO3PrScO3 template on miscut substrates

dc.contributor.authorFolkman, Chad M.en_US
dc.contributor.authorDas, R. R.en_US
dc.contributor.authorEom, Chang-Beomen_US
dc.contributor.authorChen, Y. B.en_US
dc.contributor.authorPan, Xiaoqingen_US
dc.date.accessioned2011-11-15T16:09:07Z
dc.date.available2011-11-15T16:09:07Z
dc.date.issued2006-11-27en_US
dc.identifier.citationFolkman, C. M.; Das, R. R.; Eom, C. B.; Chen, Y. B.; Pan, X. Q. (2006). "Single domain strain relaxed PrScO3PrScO3 template on miscut substrates." Applied Physics Letters 89(22): 221904-221904-3. <http://hdl.handle.net/2027.42/87808>en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/87808
dc.description.abstractThe authors have grown strain relaxed epitaxial template of a rare-earth scandate, PrScO3PrScO3, on miscut (001) SrTiO3SrTiO3 and (001) (LaAlO3)0.3–(Sr2AlTaO3)0.7(LaAlO3)0.3–(Sr2AlTaO3)0.7 substrates by pulsed laser deposition of PrScO3PrScO3 buffer layers followed by postannealing and overlayer growth. X-ray diffraction exhibits that the PrScO3PrScO3 is a single domain with bulk lattice parameters and the out-of-plane crystalline quality is comparable with SrTiO3SrTiO3 single crystals. Cross-sectional transmission electron microscopy micrographs show dislocation-free overlayers containing boundaries with very small in-plane misalignment. The growth of strain relaxed rare-earth scandate templates with controlled lattice parameters offers strain and domain engineering of epitaxial multifunctional oxide thin films.en_US
dc.publisherThe American Institute of Physicsen_US
dc.rights© The American Institute of Physicsen_US
dc.titleSingle domain strain relaxed PrScO3PrScO3 template on miscut substratesen_US
dc.typeArticleen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109en_US
dc.contributor.affiliationotherDepartment of Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/87808/2/221904_1.pdf
dc.identifier.doi10.1063/1.2396920en_US
dc.identifier.sourceApplied Physics Lettersen_US
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dc.owningcollnamePhysics, Department of


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