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P‐64: UV‐Light‐Modified Polyimide Films for Liquid‐Crystal Alignment

dc.contributor.authorGong, S.en_US
dc.contributor.authorKanicki, J.en_US
dc.contributor.authorMa, L.en_US
dc.contributor.authorZhong, J. Z. Z.en_US
dc.date.accessioned2012-07-12T17:23:25Z
dc.date.available2012-07-12T17:23:25Z
dc.date.issued1998-05en_US
dc.identifier.citationGong, S.; Kanicki, J.; Ma, L.; Zhong, J. Z. Z. (1998). "P‐64: UV‐Light‐Modified Polyimide Films for Liquid‐Crystal Alignment." SID Symposium Digest of Technical Papers 29(1). <http://hdl.handle.net/2027.42/92039>en_US
dc.identifier.issn0097-966Xen_US
dc.identifier.issn2168-0159en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/92039
dc.description.abstractInfrared, UV‐visible and X‐ray photoelectron spectroscopy measurements indicate that bond‐breaking and oxidation occur during broadband UV‐illumination of the polyimide film in the air. Surface tension and polarity are increased based on the measurements of contact angles. No obvious morphology change has been observed through atomic force microscopy analysis. While the polarized UV‐light generates a relatively small pretilt angle on a nonrubbed surface, it reduces the pretilt angle to some degree on a rubbed surface, depending upon the UV‐light polarization direction relative to the rubbing direction.en_US
dc.publisherBlackwell Publishing Ltden_US
dc.publisherWiley Periodicals, Inc.en_US
dc.titleP‐64: UV‐Light‐Modified Polyimide Films for Liquid‐Crystal Alignmenten_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelElectrical Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumUniversity of Michigan, Ann Arbor, MIen_US
dc.contributor.affiliationotherOIS Optical Imaging Systems, Northville, MIen_US
dc.identifier.pmid9598991en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/92039/1/1.1833863.pdf
dc.identifier.doi10.1889/1.1833863en_US
dc.identifier.sourceSID Symposium Digest of Technical Papersen_US
dc.identifier.citedreferenceJ. Chen, D. L. Johnson, P. L. Bos, X. Wang and J. L. West, SID Symposium Digest 27, 634 ( 1996 ).en_US
dc.identifier.citedreferenceX. Wang, D. Subacius, O. Lavrentovich, J. L. West and Y. Reznikov, SID Symposium Digest 27, 654 ( 1996 ).en_US
dc.identifier.citedreferenceM. Schadt, K. Schmitt, V. Kozinkov, and V. Chigrinov, Jpn. J. Appl. Phys., 31, 2155 ( 1992 ).en_US
dc.identifier.citedreferenceS. Wu, J. Adhes., 5, 39 ( 1973 ).en_US
dc.identifier.citedreferenceD. Acquard and A. Abileah, Display Works' 98, Digest of Technical Papers, 33 ( 1998 ).en_US
dc.identifier.citedreferenceJ. Lu, S. V. Deshpande, E. Gulari, J. Kanicki and W. L. Warren, J. Appl. Phys. 80, 5028 ( 1996 ).en_US
dc.identifier.citedreferenceY. Limura and S. Kobayashi, SID Symposium Digest 28, 311 ( 1997 ).en_US
dc.identifier.citedreferenceK. W. Lee, A. Lien, J. Stathis and S. H. Peak, SID Symposium Digest 27, 638 ( 1996 ).en_US
dc.identifier.citedreferenceT. Yamamoto, M. Hasegawa and H. Hatoh, SID Symposium Digest 27, 642 ( 1996 ).en_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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