Show simple item record

Effects of Bi on the Morphology and Atomic Structure of III-V Semiconductor Surfaces.

dc.contributor.authorDuzik, Adam Jamesen_US
dc.date.accessioned2014-01-16T20:41:46Z
dc.date.availableNO_RESTRICTIONen_US
dc.date.available2014-01-16T20:41:46Z
dc.date.issued2013en_US
dc.date.submitted2013en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/102441
dc.description.abstractUse of Bi in III-V semiconductor films in recent years has a variety of applications. Bi lowers the bandgap, introduces a large spin-orbit coupling, and preserves electron mobility, enabling low bandgap, high mobility and novel spintronic devices. Bi is also a nearly ideal surfactant, smoothing the surface, creating the right conditions for a sharp, high quality interface. However, the mechanism for this behavior and the atomic surface reconstructions are poorly characterized, both for surface- and bulk-incorporated Bi. This dissertation consists of four studies to investigate this behavior. The first half explores the effects of Bi as an ideal surfactant. The first study is an experimental scanning tunneling microscopy characterization of the Bi/GaAs surface, revealing the same reconstruction appears for the observed (1x3), (2x3), and (4x3) reflective high-energy electron diffraction patterns. Steps become wider on the micron length scale from the induced smoothing, owing to the increase of opposite direction step edges on the nanometer length scale. The second study is a combined cluster expansion aand density functional theory (DFT) analysis of the Bi/GaAs xvi reconstructions. The (4x3) reconstruction was found to stabilize into a variety of compositions in the presence of Bi. Monte Carlo analysis of the (4x3) reconstruction shows a strong propensity for surface disorder even at temperatures well below Bi deposition temperatures. The second half focuses on the surface effects of incorporated Bi. In the third study, several GaSbBi films were grown as a function of Ga, Sb, and Bi growth rates. Biphasic droplets were observed, with sub-droplets, facets, and etching into the film. X-ray diffraction and Rutherford backscatter measurements showed a con- current increase in Bi and As concentration, indicating a previously unseen strain auto-compensation mechanism. The fourth study is a cluster expansion/DFT char- acterization of the Bi/GaSb surface system as a proxy for the GaSbBi surface. In par- ticular, the c(2x10) reconstruction was investigated for the bare GaSb and Bi/GaSb systems, where the instability of this reconstruction was established in a rigorous manner. Finally, the Bi-induced (2x1) reconstruction was found to be stable in the Bi/GaSb system, consistent with other Bi/III-V systems.en_US
dc.language.isoen_USen_US
dc.subjectBi-induced III-V Semiconductor Surfacesen_US
dc.subjectMolecular Beam Epitaxy (MBE)en_US
dc.subjectDensity Functional Theory (DFT)en_US
dc.subjectBi Surfactant on GaAs and GaSben_US
dc.subjectBi Incorporation Into GaSben_US
dc.subjectReconstruction Stability of Bi/GaAs and Bi/GaSben_US
dc.titleEffects of Bi on the Morphology and Atomic Structure of III-V Semiconductor Surfaces.en_US
dc.typeThesisen_US
dc.description.thesisdegreenamePhDen_US
dc.description.thesisdegreedisciplineMaterials Science and Engineeringen_US
dc.description.thesisdegreegrantorUniversity of Michigan, Horace H. Rackham School of Graduate Studiesen_US
dc.contributor.committeememberMillunchick, Joanna Mireckien_US
dc.contributor.committeememberPhillips, Jamie Deanen_US
dc.contributor.committeememberPearson, Christopher A.en_US
dc.contributor.committeememberVan Der Ven, Antonen_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/102441/1/aduzik_1.pdf
dc.owningcollnameDissertations and Theses (Ph.D. and Master's)


Files in this item

Show simple item record

Remediation of Harmful Language

The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.

Accessibility

If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.