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Economical, Isotropic Silicon Etching Machine

dc.contributor.authorHerrick, Amandaen_US
dc.contributor.authorKloess, Jasonen_US
dc.contributor.authorVerner, Sarahen_US
dc.contributor.authorWang, Johnen_US
dc.date.accessioned2014-11-06T19:51:24Z
dc.date.available2014-11-06T19:51:24Z
dc.date.issued2010-04en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/109381
dc.descriptionME450 Capstone Design and Manufacturing Experience: Winter 2010en_US
dc.description.abstractThe equipment used to isotropically etch silicon wafers for MEMS (Micro Electro-Mechanical Systems) applications is very expensive. Due to this, the amount of growth of this developing technology is limited to entities with large monetary resources. The goal of this project is to design an alternative piece of equipment which achieves the same results but at a more economical cost. The introduction of a less expensive alternative will expand MEMS technology to more people and in turn technology will be able to progress at a faster rate.en_US
dc.subjectME450en_US
dc.titleEconomical, Isotropic Silicon Etching Machineen_US
dc.typeProjecten_US
dc.subject.hlbsecondlevelMechanical Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.contributor.affiliationumcampusAnn Arboren_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/109381/1/me450w10project23_report.pdf
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/109381/2/me450w10project23_photo1.jpg
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/109381/3/me450w10project23_photo2.jpg
dc.owningcollnameMechanical Engineering, Department of


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