View Item 

Show simple item record

Plasmonic tuning of aluminum doped zinc oxide nanostructures by atomic layer deposition
dc.contributor.authorRiley, Conor T.en_US
dc.contributor.authorKieu, Tien A.en_US
dc.contributor.authorSmalley, Joseph S. T.en_US
dc.contributor.authorPan, Si Hui Athenaen_US
dc.contributor.authorKim, Sung Jooen_US
dc.contributor.authorPost, Kirk W.en_US
dc.contributor.authorKargar, Alirezaen_US
dc.contributor.authorBasov, Dimitri N.en_US
dc.contributor.authorPan, Xiaoqingen_US
dc.contributor.authorFainman, Yeshaiahuen_US
dc.contributor.authorWang, Delien_US
dc.contributor.authorSirbuly, Donald J.en_US
dc.date.accessioned2014-12-09T16:53:56Z
dc.date.availableWITHHELD_12_MONTHSen_US
dc.date.available2014-12-09T16:53:56Z
dc.date.issued2014-11en_US
dc.identifier.citationRiley, Conor T.; Kieu, Tien A.; Smalley, Joseph S. T.; Pan, Si Hui Athena; Kim, Sung Joo; Post, Kirk W.; Kargar, Alireza; Basov, Dimitri N.; Pan, Xiaoqing; Fainman, Yeshaiahu; Wang, Deli; Sirbuly, Donald J. (2014). "Plasmonic tuning of aluminum doped zinc oxide nanostructures by atomic layer deposition." physica status solidi (RRL) – Rapid Research Letters 8(11).en_US
dc.identifier.issn1862-6254en_US
dc.identifier.issn1862-6270en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/109627
dc.publisherWILEY‐VCH Verlag Berlin GmbHen_US
dc.subject.otherSilicon Nanopillarsen_US
dc.subject.otherAtomic Layer Depositionen_US
dc.subject.otherZinc Oxideen_US
dc.subject.otherAluminum Dopingen_US
dc.subject.otherPlasmonicsen_US
dc.subject.otherNanosphere Lithographyen_US
dc.titlePlasmonic tuning of aluminum doped zinc oxide nanostructures by atomic layer depositionen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/109627/1/pssr201409359.pdf
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/109627/2/pssr201409359-sup-0001-figuresS1-S10_tableS1.pdf
dc.identifier.doi10.1002/pssr.201409359en_US
dc.identifier.sourcephysica status solidi (RRL) – Rapid Research Lettersen_US
dc.identifier.citedreferenceS. C. Gong, Y.‐J. Choi, H. Kim, C.‐S. Park, H.‐H. Park, J. G. Jang, H. J. Chang, and G. Y. Yeom, J. Vac. Sci. Technol. A 31, 01A101 ( 2013 ).en_US
dc.identifier.citedreferenceW. Cai and V. Shalaev, Optical Metamaterials: Fundamentals and Applications (Springer Verlag, New York, 2009).en_US
dc.identifier.citedreferenceG. V. Naik, V. M. Shalaev, and A. Boltasseva, Adv. Mater. 25, 3264 ( 2013 ).en_US
dc.identifier.citedreferenceM. Balkanski, A. Aziza, and E. Amzallag, Phys. Status Solidi 31, 323 ( 1969 ).en_US
dc.identifier.citedreferenceR. E. Peale, J. W. Cleary, W. R. Buchwald, and O. Edwards, presented at Biomecial Optics, Miami, FL, USA (2010).en_US
dc.identifier.citedreferenceR. Soref and J. W. Hendrickson, Opt. Express 20, 3814 ( 2012 ).en_US
dc.identifier.citedreferenceW. Walukiewicz, J. Lagowski, L. Jastrzebski, P. Rava, M. Lichtensteiger, C. H. Gatos, and H. C. Gatos, J. Appl. Phys. 51, 2659 ( 1980 ).en_US
dc.identifier.citedreferenceW. Walukiewicz, L. Lagowski, L. Jastrzebski, M. Lichtensteiger, and H. C. Gatos, J. Appl. Phys. 50, 899 ( 1979 ).en_US
dc.identifier.citedreferenceT. Yamada, E. Tokumitsu, K. Saito, T. Akatsuka, M. Miyauchi, M. Konagai, and K. Takahashi, J. Cryst. Growth 95, 145 ( 1989 ).en_US
dc.identifier.citedreferenceA. Kasic, M. Schubert, S. Einfeldt, D. Hommel, and T. E. Tiwald, Phys. Rev. B 62, 7365 ( 2000 ).en_US
dc.identifier.citedreferenceH. Agura, A. Suzuki, T. Matsushita, T. Aoki, and M. Okuda, Thin Solid Films 445, 263 ( 2003 ).en_US
dc.identifier.citedreferenceS. Q. Li, P. Guo, Z. Lingxiao, W. Zhou, T. W. Odom, T. Seideman, B. Ketterson, and R. P. H. Chang, ACS Nano 5, 9161 ( 2011 ).en_US
dc.identifier.citedreferenceG. V. Naik, J. Kim, and A. Boltasseva, Opt. Mater. Express 1, 1090 ( 2011 ).en_US
dc.identifier.citedreferenceJ. Kim, G. V. Naik, N. K. Emani, U. Guler, and A. Bol‐ tasseva, IEEE J. Sel. Topics Quantum Electron. 19, 3 ( 2013 ).en_US
dc.identifier.citedreferenceC. Guillen and J. Herrero, Vacuum 84, 924 ( 2010 ).en_US
dc.identifier.citedreferenceD. J. Lee, H. M. Kim, J. Y. Kwon, H. Choi, S. H. Kim, and K. B. Kim, J. Adv. Funct. Mater. 21, 448 ( 2011 ).en_US
dc.identifier.citedreferenceA. Frölich and M. Wegener, Opt. Mater. Express 1, 883 ( 2011 ).en_US
dc.identifier.citedreferenceS. M. George, Chem. Rev. 110, 111 ( 2010 ).en_US
dc.identifier.citedreferenceG. Garcia, R. Buonsanti, E. L. Runnerstrom, R. J. Mendelsberg, A. Llordes, A. Anders, T. J. Richardson, and D. J. Milliron, Nano Lett. 11, 4415 ( 2011 ).en_US
dc.identifier.citedreferenceH. J. M. Levinson, M. A. Cerrina Allen, R. D. Skinner, J. G. Neureuther, A. R. Peckerar, M. C. Perkins, K. F. Rooks, and M. J., Handbook of Microlithography, Micromachining, and Microfabrication (Society of Photo‐Optical Instrumentation Engineers, 1997).en_US
dc.identifier.citedreferenceA. Kargar, K. Sun, Y. Jing, C. Choi, H. Jeong, G. Y. Jung, S. Jin, and D. Wang, ACS Nano 7, 9407 ( 2013 ).en_US
dc.identifier.citedreferenceC.‐M. Hsu, S. T. Connor, M. X. Tang, and Y. Cui, Appl. Phys. Lett. 93, 133109 ( 2008 ).en_US
dc.identifier.citedreferenceW. Stöber, A. Fink, and E. Bohn, J. Colloid Interf. Sci. 26, 62 ( 1968 ).en_US
dc.identifier.citedreferenceP. Moitra, B. A. Slovick, Z. G. Yu, S. Krishnamurthy, and J. Valentine, Appl. Phys. Lett. 104, 171102 ( 2014 ).en_US
dc.identifier.citedreferenceS. Jeon, S. Bang, S. Lee, S. Kwon, W. Jeong, H. Jeon, H. J. Chang, and H.‐H. Park, J. Electrochem. Soc. 155, H738 ( 2008 ).en_US
dc.identifier.citedreferenceJ. G. Lu, S. Fujita, T. Kawaharamura, H. Nishinaka, Y. Kamada, T. Ohshima, Z. Z. Ye, Y. J. Zeng, Y. Z. Zhang, L. P. Zhu, H. P. He, and B. H. Zhao, J. Appl. Phys. 10, 083705 ( 2007 ).en_US
dc.identifier.citedreferenceP. Drude, Ann. Phys. 1, 566 ( 1900 ).en_US
dc.identifier.citedreferenceS. A. Maier, Plasmonics: Fundamentals and Applications. (Springer, New York, 2007).en_US
dc.identifier.citedreferenceD. K. Gramotnev and S. I. Bozhevolnyi, Nature Photon. 4, 83 ( 2010 ).en_US
dc.identifier.citedreferenceY. D. Jin, Acc. Chem. Res. 47, 1842 ( 2008 ).en_US
dc.identifier.citedreferenceH. Z. Yu, Y. Li, and L. M. Ou, Acc. Chem. Res. 46, 258 ( 2013 ).en_US
dc.identifier.citedreferenceK. L. Wustholz, A. I. Henry, M. McMahon, R. G. Freeman, N. Valley, M. E. Piotti, M. J. Natan, G. C. Schatz, and R. P. Van Duyne, J. Am. Chem. Soc. 132, 10903 ( 2010 ).en_US
dc.identifier.citedreferenceH. A. Atwater and A. Polman, Nature Mater. 9, 205 ( 2010 ).en_US
dc.identifier.citedreferenceW. Zhou, M. Dridi, J. Y. Suh, C. H. Kim, D. T. Co, M. R. Wasielewski, G. C. Schatz, and T. W. Odom, Nature Nanotechnol. 8, 506 ( 2013 ).en_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


Files in this item

Name:
pssr201409359.pdf
Size:
376.3KB
Format:
PDF
View/Open
Name:
pssr201409359-sup-0001-figures ...
Size:
2.712MB
Format:
PDF
View/Open

Show simple item record

Remediation of Harmful Language

The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.

Accessibility

If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.