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Soft X‐ray angle‐resolved photoemission with micro‐positioning techniques for metallic V2O3
dc.contributor.authorFujiwara, Hidenorien_US
dc.contributor.authorKiss, Takayukien_US
dc.contributor.authorWakabayashi, Yuki K.en_US
dc.contributor.authorNishitani, Yoshitoen_US
dc.contributor.authorMori, Takeoen_US
dc.contributor.authorNakata, Yukien_US
dc.contributor.authorKitayama, Satoshien_US
dc.contributor.authorFukushima, Kazuakien_US
dc.contributor.authorIkeda, Shinjien_US
dc.contributor.authorFuchimoto, Hirotoen_US
dc.contributor.authorMinowa, Yosukeen_US
dc.contributor.authorMo, Sung‐kwanen_US
dc.contributor.authorDenlinger, Jonathan D.en_US
dc.contributor.authorAllen, James W.en_US
dc.contributor.authorMetcalf, Patriciaen_US
dc.contributor.authorImai, Masakien_US
dc.contributor.authorYoshimura, Kazuyoshien_US
dc.contributor.authorSuga, Shigemasaen_US
dc.contributor.authorMuro, Takayukien_US
dc.contributor.authorSekiyama, Akiraen_US
dc.date.accessioned2015-05-04T20:37:03Z
dc.date.available2016-07-05T17:27:59Zen
dc.date.issued2015-05-01en_US
dc.identifier.citationFujiwara, Hidenori; Kiss, Takayuki; Wakabayashi, Yuki K.; Nishitani, Yoshito; Mori, Takeo; Nakata, Yuki; Kitayama, Satoshi; Fukushima, Kazuaki; Ikeda, Shinji; Fuchimoto, Hiroto; Minowa, Yosuke; Mo, Sung‐kwan ; Denlinger, Jonathan D.; Allen, James W.; Metcalf, Patricia; Imai, Masaki; Yoshimura, Kazuyoshi; Suga, Shigemasa; Muro, Takayuki; Sekiyama, Akira (2015). "Soft Xâ ray angleâ resolved photoemission with microâ positioning techniques for metallic V2O3." Journal of Synchrotron Radiation 22(3).en_US
dc.identifier.issn1600-5775en_US
dc.identifier.issn1600-5775en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/111241
dc.publisherInternational Union of Crystallographyen_US
dc.publisherWiley Periodicals, Inc.en_US
dc.subject.otherstrongly correlated oxideen_US
dc.subject.otherangle‐resolved photoemission spectroscopy (ARPES)en_US
dc.subject.othersoft X‐rayen_US
dc.subject.othermicro‐positioningen_US
dc.titleSoft X‐ray angle‐resolved photoemission with micro‐positioning techniques for metallic V2O3en_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumRandall Laboratory of Physics, University of Michigan, Ann Arbor, MI 48109, USAen_US
dc.contributor.affiliationotherAdvanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USAen_US
dc.contributor.affiliationotherFaculty of Science and Engineering, Konan University, Okamoto 8‐9‐1, Kobe, Hyogo 658‐8501, Japanen_US
dc.contributor.affiliationotherGraduate School of Engineering Science, Osaka University, Machikaneyama 1‐3, Toyonaka, Osaka 560‐8531, Japanen_US
dc.contributor.affiliationotherDepartment of Physics, Purdue University, West Lafayette, IN 47907, USAen_US
dc.contributor.affiliationotherJapan Synchrotron Radiation Research Institute (JASRI), Kouto 1‐1‐1, Sayo, Hyogo 679‐5198, Japanen_US
dc.contributor.affiliationotherInstitute of Scientific and Industrial Research, Osaka University, Mihogaoka 8‐1, Ibaraki, Osaka 567‐0047, Japanen_US
dc.contributor.affiliationotherDepartment of Chemistry, Graduate School of Science, Kyoto University, Oiwake Town, Kitashirakawa, Sakyo, Kyoto 606‐8502, Japanen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/111241/1/S1600577515003707.pdf
dc.identifier.doi10.1107/S1600577515003707en_US
dc.identifier.sourceJournal of Synchrotron Radiationen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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