Show simple item record

Wafer -level packaging and frequency trimming by localized mass deposition.

dc.contributor.authorChang-Chien, Patty Pei-Ling
dc.contributor.advisorWise, Kensall D.
dc.date.accessioned2016-08-30T17:47:48Z
dc.date.available2016-08-30T17:47:48Z
dc.date.issued2002
dc.identifier.urihttp://gateway.proquest.com/openurl?url_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:dissertation&res_dat=xri:pqm&rft_dat=xri:pqdiss:3057919
dc.identifier.urihttps://hdl.handle.net/2027.42/131533
dc.description.abstractSilicon-glass anodic bonding, commonly used for MEMS packaging, offers many advantages. However, outgassing during the bonding process and vacuum degradation over time can significantly compromise device performance. This dissertation reports a packaging technique in which a cavity is created by anodic bonding and is subsequently vacuum-sealed by localized polysilicon chemical vapor deposition (CVD). The cavities are formed by bonding incomplete polysilicon rings, each with a heater located at the ring opening, on the silicon substrate to a glass wafer. Gas products generated during the bonding process are evacuated via ring openings, offering low and controlled cavity pressures at near ambient temperature. The cavities are sealed at 250mTorr in silane, gettering heaters located in the cavity further reduces the pressure by gettering the Si atoms. Quality factors (Qs) of ∼2300 are obtained from the embedded resonators, suggesting cavity pressures less than 50mTorr have been achieved. This technique is applied to a capacitive barometric pressure sensor with integrated vacuum reference control. The sensor module is fabricated using a double-polysilicon dissolved-wafer process. The wafers are anodically bonded, thinned, and released in EDP. Localized CVD is used to seal the cavity and to react away residual gas trapped inside to create the desired reference pressure. The estimated cavity pressures are ∼30mTorr, and these barometric pressure sensors are capable of resolving 25mTorr over a 300Torr dynamic range. The described packaging technique is also applied to a trimming module, which is designed to investigate the feasibility of post-packaging frequency trimming by localized CVD. The module contains a resonator for pressure sensing, a gettering heater for pressure control, and a cantilever resonator. Trimming heaters located on the boss of the cantilever resonator are activated for frequency trimming in silane-sealed cavities, followed by getter activation to consume any unused gas. Precise frequency trimming of comb resonators (∼0.2%) has been demonstration by mass deposition.
dc.format.extent188 p.
dc.languageEnglish
dc.language.isoEN
dc.subjectDeposition
dc.subjectFrequency Trimming
dc.subjectHermetic Packaging
dc.subjectLocalized
dc.subjectMass
dc.subjectMems
dc.subjectWafer-level Packaging
dc.titleWafer -level packaging and frequency trimming by localized mass deposition.
dc.typeThesis
dc.description.thesisdegreenamePhDen_US
dc.description.thesisdegreedisciplineApplied Sciences
dc.description.thesisdegreedisciplineElectrical engineering
dc.description.thesisdegreedisciplinePackaging
dc.description.thesisdegreegrantorUniversity of Michigan, Horace H. Rackham School of Graduate Studies
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/131533/2/3057919.pdf
dc.owningcollnameDissertations and Theses (Ph.D. and Master's)


Files in this item

Show simple item record

Remediation of Harmful Language

The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.

Accessibility

If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.