View Item 

Show simple item record

Thermal Imprint Introduced Crystallization of A Solution Processed Subphthalocyanine Thin Film
dc.contributor.authorShu, Yu
dc.contributor.authorWang, Jingfan
dc.contributor.authorTian, Yu
dc.contributor.authorLiang, Xiaogan
dc.contributor.authorLin, Shangchao
dc.contributor.authorMa, Biwu
dc.date.accessioned2016-10-17T21:18:38Z
dc.date.available2017-11-01T15:31:29Zen
dc.date.issued2016-09
dc.identifier.citationShu, Yu; Wang, Jingfan; Tian, Yu; Liang, Xiaogan; Lin, Shangchao; Ma, Biwu (2016). "Thermal Imprint Introduced Crystallization of A Solution Processed Subphthalocyanine Thin Film." Advanced Materials Interfaces 3(17): n/a-n/a.
dc.identifier.issn2196-7350
dc.identifier.issn2196-7350
dc.identifier.urihttps://hdl.handle.net/2027.42/134175
dc.publisherWiley Periodicals, Inc.
dc.subject.othersubphthalocyanine
dc.subject.otherthermal imprint
dc.subject.othermolecular dynamics simulation
dc.subject.othercharge transport
dc.subject.otherorganic semiconductors
dc.titleThermal Imprint Introduced Crystallization of A Solution Processed Subphthalocyanine Thin Film
dc.typeArticleen_US
dc.rights.robotsIndexNoFollow
dc.subject.hlbsecondlevelMaterials Science and Engineering
dc.subject.hlbtoplevelEngineering
dc.description.peerreviewedPeer Reviewed
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/134175/1/admi201600179.pdf
dc.identifier.doi10.1002/admi.201600179
dc.identifier.sourceAdvanced Materials Interfaces
dc.identifier.citedreferenceB. Hess, C. Kutzner, D. van der Spoel, E. Lindahl, J. Chem. Theory Comput. 2008, 4, 435.
dc.identifier.citedreferencea) V. Coropceanu, J. Cornil, D. A. da Silva Filho, Y. Olivier, R. Silbey, J.‐L. Brédas, Chem. Rev. 2007, 107, 926; b) A. A. Virkar, S. Mannsfeld, Z. Bao, N. Stingelin, Adv. Mater. 2010, 22, 3857; c) R. Li, W. Hu, Y. Liu, D. Zhu, Acc. Chem. Res. 2010, 43, 529.
dc.identifier.citedreferenceR. R. Lunt, J. B. Benziger, S. R. Forrest, Adv. Mater. 2010, 22, 1233.
dc.identifier.citedreferenceL. Jiang, H. L. Dong, W. P. Hu, J. Mater. Chem. 2010, 20, 4994.
dc.identifier.citedreferencea) Y. Zhang, D. Hanifi, E. Lim, S. Chourou, S. Alvarez, A. Pun, A. Hexemer, B. W. Ma, Y. Liu, Adv. Mater. 2014, 26, 1223; b) M. J. Hollamby, M. Karny, P. H. H. Bomans, N. A. J. M. Sommerdijk, A. Saeki, S. Seki, H. Minamikawa, I. Grillo, B. R. Pauw, P. Brown, J. Eastoe, H. Mohwald, T. Nakanishi, Nat. Chem. 2014, 6, 941; c) B. J. Rancatore, C. E. Mauldin, S. H. Tung, C. Wang, A. Hexemer, J. Strzalka, J. M. J. Frechet, T. Xu, ACS Nano 2010, 4, 2721.
dc.identifier.citedreferencea) D. J. Mascaro, M. E. Thompson, H. I. Smith, V. Bulović, Org. Electron. 2005, 6, 211; b) P. Vlachos, B. Mansoor, M. P. Aldred, M. O’Neill, S. M. Kelly, Chem. Commun. 2005, 23, 2921; c) J. Rivnay, L. H. Jimison, J. E. Northrup, M. F. Toney, R. Noriega, S. Lu, T. J. Marks, A. Facchetti, A. Salleo, Nat. Mater. 2009, 8, 952; d) J. Zhang, I. Salzmann, P. Schäfer, M. Oehzelt, S. Duhm, J. P. Rabe, N. Koch, J. Mater. Res. 2009, 24, 1492; e) S.‐W. Park, J.‐M. Choi, K. H. Lee, H. W. Yeom, S. Im, Y. K. Lee, J. Phys. Chem. B 2010, 114, 5661; f) J. Smith, R. Hamilton, Y. Qi, A. Kahn, D. D. C. Bradley, M. Heeney, I. McCulloch, T. D. Anthopoulos, Adv. Funct. Mater. 2010, 20, 2330.
dc.identifier.citedreferenceY. Diao, L. Shaw, Z. A. Bao, S. C. B. Mannsfeld, Energy Environ. Sci. 2014, 7, 2145.
dc.identifier.citedreferencea) Z. Hu, G. Baralia, V. Bayot, J.‐F. Gohy, A. M. Jonas, Nano Lett. 2005, 5, 1738; b) B. C. Okerberg, C. L. Soles, J. F. Douglas, H. W. Ro, A. Karim, D. R. Hines, Macromolecules 2007, 40, 2968.
dc.identifier.citedreferencea) G. E. Morse, T. P. Bender, ACS Appl. Mater. Interfaces 2012, 4, 5055; b) C. G. Claessens, D. Gonzalez‐Rodriguez, T. Torres, Chem. Rev. 2002, 102, 835.
dc.identifier.citedreferencea) B. Ma, C. H. Woo, Y. Miyamoto, J. M. J. Fréchet, Chem. Mater. 2009, 21, 1413; b) B. W. Ma, Y. Miyamoto, C. H. Woo, J. M. J. Frechet, F. Zhang, Y. Liu, Org. Photovoltaics X 2009, 7416, 74161E.
dc.identifier.citedreferenceC. E. Mauldin, C. Piliego, D. Poulsen, D. A. Unruh, C. Woo, B. Ma, J. L. Mynar, J. M. J. Fréchet, ACS Appl. Mater. Interfaces 2010, 2, 2833.
dc.identifier.citedreferencea) J. Xue, S. Uchida, B. P. Rand, S. R. Forrest, Appl. Phys. Lett. 2004, 84, 3013; b) M. D. Perez, C. Borek, S. R. Forrest, M. E. Thompson, J. Am. Chem. Soc. 2009, 131, 9281.
dc.identifier.citedreferenceX. Liang, T. Chen, Y.‐S. Jung, Y. Miyamoto, G. Han, S. Cabrini, B. Ma, D. L. Olynick, ACS Nano 2010, 4, 2627.
dc.identifier.citedreferencea) F. Camerel, G. Ulrich, P. Retailleau, R. Ziessel, Angew. Chem. Int. Ed. 2008, 47, 8876; b) Y. Ren, A. M. Hiszpanski, Y. L. Loo, Chem. Mater. 2015, 27, 4008.
dc.identifier.citedreferencea) A. Laio, M. Parrinello, Proc. Natl. Acad. Sci. USA 2002, 99, 12562; b) M. R. Sorensen, A. F. Voter, J. Chem. Phys. 2000, 112, 9599.
dc.identifier.citedreferenceS. R. Forrest, Nature 2004, 428, 911.
dc.identifier.citedreferenceX. Liang, T. Chen, Y.‐S. Jung, Y. Miyamoto, G. Han, S. Cabrini, B. Ma, D. L. Olynick, ACS Nano 2010, 4, 2627.
dc.identifier.citedreferencea) S. Nosé, J. Chem. Phys. 1984, 81, 511; b) W. G. Hoover, Phys. Rev. A 1985, 31, 1695.
dc.identifier.citedreferenceM. Parrinello, A. Rahman, J. Appl. Phys. 1981, 52, 7182.
dc.identifier.citedreferenceA. K. Rappe, C. J. Casewit, K. S. Colwell, W. A. Goddard, W. M. Skiff, J. Am. Chem. Soc. 1992, 114, 10024.
dc.identifier.citedreferencea) J. J. P. Stewart, J. Comput. Chem. 1989, 10, 209; b) J. J. P. Stewart, J. Comput. Chem. 1989, 10, 221; c) J. J. P. Stewart, J. Comput. Chem. 1991, 12, 320; d) J. J. P. Stewart, J. Mol. Model. 2004, 10, 155.
dc.identifier.citedreferencea) U. Essmann, L. Perera, M. L. Berkowitz, T. Darden, H. Lee, L. G. Pedersen, J. Chem. Phys. 1995, 103, 8577; b) T. Darden, D. York, L. Pedersen, J. Chem. Phys. 1993, 98, 10089.
dc.owningcollnameInterdisciplinary and Peer-Reviewed


Files in this item

Name:
admi201600179.pdf
Size:
6.681MB
Format:
PDF
View/Open

Show simple item record

Remediation of Harmful Language

The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.

Accessibility

If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.