Nanoimprint Lithography: Angleâ  Insensitive and CMOSâ  Compatible Subwavelength Color Printing (Advanced Optical Materials 11/2016)

Lee, Kyu‐tae; Jang, Ji‐yun; Park, Sang Jin; Ji, Chengang; Yang, Sung‐mo; Guo, L. Jay; Park, Hui Joon

Nanoimprint Lithography: Angleâ Insensitive and CMOSâ Compatible Subwavelength Color Printing (Advanced Optical Materials 11/2016)

dc.contributor.author	Lee, Kyu‐tae
dc.contributor.author	Jang, Ji‐yun
dc.contributor.author	Park, Sang Jin
dc.contributor.author	Ji, Chengang
dc.contributor.author	Yang, Sung‐mo
dc.contributor.author	Guo, L. Jay
dc.contributor.author	Park, Hui Joon
dc.date.accessioned	2017-01-06T20:49:33Z
dc.date.available	2018-01-08T19:47:52Z	en
dc.date.issued	2016-11
dc.identifier.citation	Lee, Kyu‐tae ; Jang, Ji‐yun ; Park, Sang Jin; Ji, Chengang; Yang, Sung‐mo ; Guo, L. Jay; Park, Hui Joon (2016). "Nanoimprint Lithography: Angleâ Insensitive and CMOSâ Compatible Subwavelength Color Printing (Advanced Optical Materials 11/2016)." Advanced Optical Materials 4(11): 1695-1695.
dc.identifier.issn	2195-1071
dc.identifier.issn	2195-1071
dc.identifier.uri	https://hdl.handle.net/2027.42/135024
dc.publisher	Wiley Periodicals, Inc.
dc.subject.other	angleâ insensitivity
dc.subject.other	color filters
dc.subject.other	nanocavities
dc.subject.other	nanoimprint lithography
dc.subject.other	nanostructures
dc.title	Nanoimprint Lithography: Angleâ Insensitive and CMOSâ Compatible Subwavelength Color Printing (Advanced Optical Materials 11/2016)
dc.type	Article	en_US
dc.rights.robots	IndexNoFollow
dc.subject.hlbsecondlevel	Materials Science and Engineering
dc.subject.hlbtoplevel	Engineering
dc.description.peerreviewed	Peer Reviewed
dc.description.bitstreamurl	http://deepblue.lib.umich.edu/bitstream/2027.42/135024/1/adom201670062.pdf
dc.identifier.doi	10.1002/adom.201670062
dc.identifier.source	Advanced Optical Materials
dc.owningcollname	Interdisciplinary and Peer-Reviewed

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