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Generation of submicron metal particles

dc.contributor.authorSherman, P. M. (Pauline M.)en_US
dc.date.accessioned2006-04-07T16:38:10Z
dc.date.available2006-04-07T16:38:10Z
dc.date.issued1975-04en_US
dc.identifier.citationSherman, P. M. (1975/04)."Generation of submicron metal particles." Journal of Colloid and Interface Science 51(1): 87-93. <http://hdl.handle.net/2027.42/22079>en_US
dc.identifier.urihttp://www.sciencedirect.com/science/article/B6WHR-4CV80P6-J8/2/8a9d7ed26656b7a121d1db88de59a022en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/22079
dc.description.abstractA low inductance circuit was designed, built and employed for the evaporation of metal wires with subsequent condensation of the metal vapor into small particles. The metal vapor was produced by the fast transfer of energy stored in a capacitor. A single pulse discharge with current and voltage going to zero simultaneously without the usual oscillation or dwell and restrike, was employed for each measurement of actual energy transferred to the wire (rather than energy stored). Silver, cadmium, and zinc wire were used in ambient atmospheres of air, of helium or of argon. The particles generated were measured by actual count employing enlarged photographs taken from electron microscope pictures of shadowed samples.The particles generated were spherical in shape and in the submicron range (50-1,000 A), with roughly a log normal distribution of diameters. The mean diameter decreased with an increase in the characteristic length for the expansion based on the energy transferred. The kind of ambient gas appears to have at most a minor effect on the particle size generated (when there is no chemical reaction).en_US
dc.format.extent4135339 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherElsevieren_US
dc.titleGeneration of submicron metal particlesen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbsecondlevelChemistryen_US
dc.subject.hlbsecondlevelChemical Engineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Aerospace Engineering, The University of Michigan, Ann Arbor, Michigan 48105, USAen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/22079/1/0000503.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1016/0021-9797(75)90086-7en_US
dc.identifier.sourceJournal of Colloid and Interface Scienceen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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