Small-polaron mobility in nonstoichiometric cerium dioxide
dc.contributor.author | Naik, I. K. | en_US |
dc.contributor.author | Tien, Tseng-Ying | en_US |
dc.date.accessioned | 2006-04-07T17:05:32Z | |
dc.date.available | 2006-04-07T17:05:32Z | |
dc.date.issued | 1978 | en_US |
dc.identifier.citation | Naik, I. K., Tien, T. Y. (1978)."Small-polaron mobility in nonstoichiometric cerium dioxide." Journal of Physics and Chemistry of Solids 39(3): 311-315. <http://hdl.handle.net/2027.42/22734> | en_US |
dc.identifier.uri | http://www.sciencedirect.com/science/article/B6TXR-46X9F9W-2J/2/da4f8b51adf2ecc6e4c6971fb85498bf | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/22734 | |
dc.description.abstract | The high temperature drift mobility ([mu]d) of charge carriers in nonstoichiometric cerium dioxide (CeO2-x) has been calculated by combining the electrical conductivity and nonstoichiometry data on the basis of the oxygen vacancy model with correct ionization state. The electrical conductivity was measured by a four-probe d.c. technique and the nonstoichiometry by thermogravimetric analysis. The dilute solution model of the point defects is valid up to x = 0.03. From the magnitude of [mu]d and its temperature dependence, the charge carriers in CeO2-x, are proposed to be small-polarons formed by localization of electrons at cerium sites and the charge transport process is proposed to occur by a hopping mechanism. The observed temperature dependence of [mu]d is in accord with that derived by Holstein and Friedman for small-polaron transport by the hopping mechanism. The activation energy of mobility is found to increase with increasing x as expected for the hopping model. | en_US |
dc.format.extent | 548993 bytes | |
dc.format.extent | 3118 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.language.iso | en_US | |
dc.publisher | Elsevier | en_US |
dc.title | Small-polaron mobility in nonstoichiometric cerium dioxide | en_US |
dc.type | Article | en_US |
dc.rights.robots | IndexNoFollow | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Materials and Metallurgical Engineering, The University of Michigan, Ann Arbor, MI 48109, U.S.A. | en_US |
dc.contributor.affiliationum | Department of Materials and Metallurgical Engineering, The University of Michigan, Ann Arbor, MI 48109, U.S.A. | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/22734/1/0000289.pdf | en_US |
dc.identifier.doi | http://dx.doi.org/10.1016/0022-3697(78)90059-8 | en_US |
dc.identifier.source | Journal of Physics and Chemistry of Solids | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
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