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Characterization of a circular thin film plasma source for atomic emission spectroscopy

dc.contributor.authorSwan, J. M.en_US
dc.contributor.authorSacks, Richard D.en_US
dc.date.accessioned2006-04-07T19:16:15Z
dc.date.available2006-04-07T19:16:15Z
dc.date.issued1985en_US
dc.identifier.citationSwan, J. M., Sacks, R. D. (1985)."Characterization of a circular thin film plasma source for atomic emission spectroscopy." Spectrochimica Acta Part B: Atomic Spectroscopy 40(9): 1239-1254. <http://hdl.handle.net/2027.42/25931>en_US
dc.identifier.urihttp://www.sciencedirect.com/science/article/B6THN-44PW70V-22/2/c4855814bcc97e074c624258bfb330e9en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/25931
dc.description.abstractA plasma source for analytical atomic emission spectroscopy is described based on the electrical vaporization by capacitive discharge of a thin Ag film deposited on a polycarbonate membrane filter. The source is designed for the rapid, direct analysis of solid powder samples collected by filtration from fluid media. A concentric electrode system consisting of a ring-shaped graphite electrode placed on the thin film surface and a pointed graphite rod located under the membrane substrate results in a plasma with cylindrical symmetry and a radial current path. Discharge current vs time and intensity vs time profiles are compared for the concentric electrode geometry and the linear geometry used in previous studies. Two values of tank circuit inductance also are compared. Both neutral-atom and ion line radiation from an Mn sample are more intense when the center electrode is initially cathodic. The inside diameter of the ring-shaped electrode and thus the surface area of the Ag film exposed to the plasma have relatively little effect on the intensity of continuum background and line radiation from a sample deposited near the center of the film. Particle size effects, while significant, are smaller than with the linear electrode geometry. Analytical curves are presented for several lines using both a low-inductance and a high-inductance discharge. Log-log slopes range from about 0.85 to 1.05 for ion lines. Detection limits are somewhat poorer than with the linear geometry.en_US
dc.format.extent1219081 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherElsevieren_US
dc.titleCharacterization of a circular thin film plasma source for atomic emission spectroscopyen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbsecondlevelChemistryen_US
dc.subject.hlbsecondlevelChemical Engineeringen_US
dc.subject.hlbsecondlevelBiological Chemistryen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.subject.hlbtoplevelHealth Sciencesen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Chemistry, University of Michigan, Ann Arbor, MI 48109, U.S.A.en_US
dc.contributor.affiliationumDepartment of Chemistry, University of Michigan, Ann Arbor, MI 48109, U.S.A.en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/25931/1/0000494.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1016/0584-8547(85)80151-8en_US
dc.identifier.sourceSpectrochimica Acta Part B: Atomic Spectroscopyen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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