Radiative properties of an electrically-vaporized thin film plasma in an external magnetic field
dc.contributor.author | Albers, D. | en_US |
dc.contributor.author | Sacks, Richard D. | en_US |
dc.date.accessioned | 2006-04-07T19:39:44Z | |
dc.date.available | 2006-04-07T19:39:44Z | |
dc.date.issued | 1986 | en_US |
dc.identifier.citation | Albers, D., Sacks, R. (1986)."Radiative properties of an electrically-vaporized thin film plasma in an external magnetic field." Spectrochimica Acta Part B: Atomic Spectroscopy 41(4): 391-402. <http://hdl.handle.net/2027.42/26412> | en_US |
dc.identifier.uri | http://www.sciencedirect.com/science/article/B6THN-44KR0HW-9W/2/a405f8d0f43ab065c7a1992d6f8b48a8 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/26412 | |
dc.description.abstract | An external magnetic field of a few kilogauss is used to alter significantly the radiative properties of the plasmas generated by the capacitive discharge vaporization ofthin Ag films. The magnetic field is generated by the plasma current in a large inductor surrounding the plasma. The magnetic field is oriented normal to the electric field in the plasma. This generates a drift motion of the plasma normal to the plane established by the electric and magnetic field vectors. The drift motion can direct the plasma toward the plastic substrate on which the Ag film and a powder or solution residue sample were originally located. This increases the plasma-sample interaction. Time integrated, spatially resolved photographic spectra and spatially resolved photoelectric radiation profiles show that with the magnetic field, the continuum background radiation is confined to a relatively small region near the substrate surface. This results in significantly larger analyte line-to-background intensity ratios in the region 1-2 cm above the substrate surface. | en_US |
dc.format.extent | 1101492 bytes | |
dc.format.extent | 3118 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.language.iso | en_US | |
dc.publisher | Elsevier | en_US |
dc.title | Radiative properties of an electrically-vaporized thin film plasma in an external magnetic field | en_US |
dc.type | Article | en_US |
dc.rights.robots | IndexNoFollow | en_US |
dc.subject.hlbsecondlevel | Materials Science and Engineering | en_US |
dc.subject.hlbsecondlevel | Chemistry | en_US |
dc.subject.hlbsecondlevel | Chemical Engineering | en_US |
dc.subject.hlbsecondlevel | Biological Chemistry | en_US |
dc.subject.hlbtoplevel | Engineering | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.subject.hlbtoplevel | Health Sciences | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Chemistry, University of Michigan, Ann Arbor, MI 48109, U.S.A. | en_US |
dc.contributor.affiliationum | Department of Chemistry, University of Michigan, Ann Arbor, MI 48109, U.S.A. | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/26412/1/0000499.pdf | en_US |
dc.identifier.doi | http://dx.doi.org/10.1016/0584-8547(86)80064-7 | en_US |
dc.identifier.source | Spectrochimica Acta Part B: Atomic Spectroscopy | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
Files in this item
Remediation of Harmful Language
The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.
Accessibility
If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.