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Growth and properties of In0.52Al0.48As/In0.53Ga0.47As, GaAS: In and InGaAs/GaAs multilayers

dc.contributor.authorJuang, Feng‐Yuhen_US
dc.contributor.authorHong, W. -P.en_US
dc.contributor.authorBerger, P. R.en_US
dc.contributor.authorBhattacharya, Pallab K.en_US
dc.contributor.authorDas, Utpalen_US
dc.contributor.authorSingh, Jaspriten_US
dc.date.accessioned2006-04-07T19:57:10Z
dc.date.available2006-04-07T19:57:10Z
dc.date.issued1987-02-02en_US
dc.identifier.citationJuang, F. -Y., Hong, W. -P., Berger, P. R., Bhattacharya, P. K., Das, U., Singh, J. (1987/02/02)."Growth and properties of In0.52Al0.48As/In0.53Ga0.47As, GaAS: In and InGaAs/GaAs multilayers." Journal of Crystal Growth 81(1-4): 373-377. <http://hdl.handle.net/2027.42/26809>en_US
dc.identifier.urihttp://www.sciencedirect.com/science/article/B6TJ6-46X9W77-2C/2/795abc878923b46d88d5538f4b3fc6c8en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/26809
dc.description.abstractWe have investigated the properties of some In-containing materials and heterostructures grown by molecular beam epitaxy on GaAs and InP substrates. Photoluminescence spectra of InGaAs/InAlAs quantum wells have been related to growth kinetics and it is seen that growth interruption or the incorporation of a few periods of superlattices at the heterointerfaces smooths the growth front. Experiments have been performed to determine the properties of In0.52Al0.48As grown on InP. This lattice-matched alloy In0.52Al0.48As may be clustered under normal growth conditions at a substrate temperature ~ 500[deg]C. Addition of small amounts of In(0.2-1.2%) to GaAs reduces trap and defect densities in these materials, as seen from DLTS and low-temperature photoluminescence data. The improvement may be related to the higher surface migration rate of In compared to Ga and a subsequent reduction of point defects. Single-mode optical guides and direction couplers with losses as low as 1-3 dB/cm have been fabricated with GaAs: In and In0.2Ga0.8As/GaAs strained-layer superlattices.en_US
dc.format.extent473312 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherElsevieren_US
dc.titleGrowth and properties of In0.52Al0.48As/In0.53Ga0.47As, GaAS: In and InGaAs/GaAs multilayersen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbsecondlevelMathematicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumSolid State Electronics Laboratory, Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109, USAen_US
dc.contributor.affiliationumSolid State Electronics Laboratory, Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109, USAen_US
dc.contributor.affiliationumSolid State Electronics Laboratory, Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109, USAen_US
dc.contributor.affiliationumSolid State Electronics Laboratory, Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109, USAen_US
dc.contributor.affiliationumSolid State Electronics Laboratory, Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109, USAen_US
dc.contributor.affiliationumSolid State Electronics Laboratory, Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109, USAen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/26809/1/0000365.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1016/0022-0248(87)90419-2en_US
dc.identifier.sourceJournal of Crystal Growthen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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