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Monomer-addition growth with a slow initiation step: A growth model for silica particles from alkoxides
dc.contributor.authorMatsoukas, Themisen_US
dc.contributor.authorGulari, Erdoganen_US
dc.date.accessioned2006-04-07T20:40:29Z
dc.date.available2006-04-07T20:40:29Z
dc.date.issued1989-10-01en_US
dc.identifier.citationMatsoukas, Themis, Gulari, Erdogan (1989/10/01)."Monomer-addition growth with a slow initiation step: A growth model for silica particles from alkoxides." Journal of Colloid and Interface Science 132(1): 13-21. <http://hdl.handle.net/2027.42/27723>en_US
dc.identifier.urihttp://www.sciencedirect.com/science/article/B6WHR-4CX71G9-8D/2/545613c6b92de7f8629bd18ec7c9a1bden_US
dc.identifier.urihttps://hdl.handle.net/2027.42/27723
dc.description.abstractA simplified monomer-addition model with a first-order activation step is developed to describe the dynamics of growth of silica particles from alkoxides. In the limit of slow hydrolysis, we obtain expressions for the evolution of the particle mass and particle polydispersity, as well as an expression for the particle size as a function of the hydrolysis rate constant, the polymerization rate constant, and the initial concentration of the orthosilicate. We find that the formation of the particles is adequately modeled by a reaction limited growth.en_US
dc.format.extent697084 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherElsevieren_US
dc.titleMonomer-addition growth with a slow initiation step: A growth model for silica particles from alkoxidesen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbsecondlevelChemistryen_US
dc.subject.hlbsecondlevelChemical Engineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Chemical Engineering, The University of Michigan, Ann Arbor, Michigan 48109, USAen_US
dc.contributor.affiliationumDepartment of Chemical Engineering, The University of Michigan, Ann Arbor, Michigan 48109, USAen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/27723/1/0000113.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1016/0021-9797(89)90210-5en_US
dc.identifier.sourceJournal of Colloid and Interface Scienceen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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