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Role of strain on threshold current, modal purity and Auger processes in strained quantum well lasers

dc.contributor.authorLoehr, John P.en_US
dc.contributor.authorSingh, Jaspriten_US
dc.date.accessioned2006-04-10T13:55:37Z
dc.date.available2006-04-10T13:55:37Z
dc.date.issued1990en_US
dc.identifier.citationLoehr, John P., Singh, Jasprit (1990)."Role of strain on threshold current, modal purity and Auger processes in strained quantum well lasers." Superlattices and Microstructures 8(3): 287-292. <http://hdl.handle.net/2027.42/28862>en_US
dc.identifier.urihttp://www.sciencedirect.com/science/article/B6WXB-4951GMY-GP/2/0d986d6379edd28b2624ff5da2ea2a2den_US
dc.identifier.urihttps://hdl.handle.net/2027.42/28862
dc.description.abstractWe present numerical calculations of material gain and threshold current density in compressively strained quantum well lasers grown on GaAs and InP. The valence bandstructure is obtained from a 4 x 4 k [middle dot] p Hamiltonian that includes the effects of strain. Calculation of the spontaneous emission rate and optical material gain proceeds directly from the bandstructure and we extract the threshold current density from the emission rate. We find that incorporating ~2% misfit strain reduces the threshold current density by 50% in the GaAs system and by 30% in the InP system. We calculate the hole masses in the presence of strain with a 6 x 6 k [middle dot] p Hamiltonian and use them to determine the effect of strain on Auger processes.en_US
dc.format.extent488747 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherElsevieren_US
dc.titleRole of strain on threshold current, modal purity and Auger processes in strained quantum well lasersen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbsecondlevelMathematicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumCenter for High Frequency Microelectronics Department of Electrical Engineering and Computer Science University of Michigan, Ann Arbor, Michigan 48109-2122, USAen_US
dc.contributor.affiliationumCenter for High Frequency Microelectronics Department of Electrical Engineering and Computer Science University of Michigan, Ann Arbor, Michigan 48109-2122, USAen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/28862/1/0000697.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1016/0749-6036(90)90249-7en_US
dc.identifier.sourceSuperlattices and Microstructuresen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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