Preparation of functionalized zinc and copper organometallics containing sulfur functionalities at the alpha or gamma position
dc.contributor.author | Achyutha Rao, Sidduri | en_US |
dc.contributor.author | Tucker, Charles E. | en_US |
dc.contributor.author | Knochel, Paul | en_US |
dc.date.accessioned | 2006-04-10T13:59:53Z | |
dc.date.available | 2006-04-10T13:59:53Z | |
dc.date.issued | 1990 | en_US |
dc.identifier.citation | AchyuthaRao, Sidduri, Tucker, Charles E., Knochel,, Paul (1990)."Preparation of functionalized zinc and copper organometallics containing sulfur functionalities at the alpha or gamma position." Tetrahedron Letters 31(52): 7575-7578. <http://hdl.handle.net/2027.42/28970> | en_US |
dc.identifier.uri | http://www.sciencedirect.com/science/article/B6THS-4325SPF-42/2/ce0c81ce72b962832b3e3fe307f7dff1 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/28970 | |
dc.description.abstract | [alpha]-Chloroalkyl phenyl sulfides 1 readily insert zinc in THF at 25 [deg]C (0.5-2 h), affording sulfur stabilized organozinc derivatives of type 2. The presence of a functional group such as an ester or a cyano group is tolerated in these organometallics. After a transmetallation to the corresponding copper reagent 3, they react with a wide range of electrophiles. Zinc and copper organometallics bearing a thiophenyl or a phenylsulfinyl group at the [gamma]-position have also been prepared showing the generality of our approach. | en_US |
dc.format.extent | 288769 bytes | |
dc.format.extent | 3118 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.language.iso | en_US | |
dc.publisher | Elsevier | en_US |
dc.title | Preparation of functionalized zinc and copper organometallics containing sulfur functionalities at the alpha or gamma position | en_US |
dc.type | Article | en_US |
dc.rights.robots | IndexNoFollow | en_US |
dc.subject.hlbsecondlevel | Materials Science and Engineering | en_US |
dc.subject.hlbsecondlevel | Chemistry | en_US |
dc.subject.hlbsecondlevel | Chemical Engineering | en_US |
dc.subject.hlbsecondlevel | Biological Chemistry | en_US |
dc.subject.hlbtoplevel | Engineering | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.subject.hlbtoplevel | Health Sciences | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | The Willard H. Dow Laboratories, Department of Chemistry, The University of Michigan Ann Arbor, Michigan 48109 U.S.A. | en_US |
dc.contributor.affiliationum | The Willard H. Dow Laboratories, Department of Chemistry, The University of Michigan Ann Arbor, Michigan 48109 U.S.A. | en_US |
dc.contributor.affiliationum | The Willard H. Dow Laboratories, Department of Chemistry, The University of Michigan Ann Arbor, Michigan 48109 U.S.A. | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/28970/1/0000807.pdf | en_US |
dc.identifier.doi | http://dx.doi.org/10.1016/S0040-4039(00)97302-7 | en_US |
dc.identifier.source | Tetrahedron Letters | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
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