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Structure and morphology of magnetron sputtered CoCr thin films

dc.contributor.authorDemczyk, Brain G.en_US
dc.date.accessioned2006-04-10T14:29:06Z
dc.date.available2006-04-10T14:29:06Z
dc.date.issued1991-12-02en_US
dc.identifier.citationDemczyk, B. G. (1991/12/02)."Structure and morphology of magnetron sputtered CoCr thin films." Journal of Magnetism and Magnetic Materials 102(3): 238-246. <http://hdl.handle.net/2027.42/28988>en_US
dc.identifier.urihttp://www.sciencedirect.com/science/article/B6TJJ-46D5N4D-48/2/b4acd78f621bf8822410f8f5218cd82cen_US
dc.identifier.urihttps://hdl.handle.net/2027.42/28988
dc.description.abstractThe growth characteristics of magnetron sputtered Co-22%Cr thin films on amorphous glass or carbon substrates have been investigated utilizing transmission electron microscopy, X-ray diffraction and electrical resistivity measurements. Results indicate that the initial deposit is "amorphous", but that small crystallites form before the film reaches 5 nm film thickness. By 10 nm, well oriented grains with hcp c-axis perpendicular to the film plane develop, and by 50 nm, a columnar microstructure is evident. A distinct subgrain structure was also observed in the thinner films (10-50 nm), and this is reflected in the electrical resistivity. These observations cannot be accounted for by an "evolutionary selection" growth scenario, but must be related to the low surface mobility of adatoms at these low substrate deposition temperatures (&lt;50[deg]C).en_US
dc.format.extent979705 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherElsevieren_US
dc.titleStructure and morphology of magnetron sputtered CoCr thin filmsen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbsecondlevelElectrical Engineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumNorth Campus Electron Microbeam Analysis Laboratory, Department of Materials Science and Engineering, The University of Michigan, Ann Arbor, MI 48109, USAen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/28988/1/0000015.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1016/0304-8853(91)90134-Ven_US
dc.identifier.sourceJournal of Magnetism and Magnetic Materialsen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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