Evolution of microstructure and magnetic properties in magnetron-sputtered CoCr thin films
dc.contributor.author | Demczyk, Brain G. | en_US |
dc.date.accessioned | 2006-04-10T14:58:50Z | |
dc.date.available | 2006-04-10T14:58:50Z | |
dc.date.issued | 1992-12 | en_US |
dc.identifier.citation | Demczyk, B. G. (1992/12)."Evolution of microstructure and magnetic properties in magnetron-sputtered CoCr thin films." Ultramicroscopy 47(4): 425-436. <http://hdl.handle.net/2027.42/29703> | en_US |
dc.identifier.uri | http://www.sciencedirect.com/science/article/B6TW1-46MKXJP-BM/2/9084b24c2b4b75ed2ec1ff4f2e147075 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/29703 | |
dc.description.abstract | The microstructure and magnetic-structure development in magnetron-sputtered Co-22at%Cr thin films deposited on amorphous substrates has been examined systematically and in detail. It has been found that the initial deposit is amorphous up to a thickness of [approximate]5 nm. By 10 nm thickness, a polycrystalline highly hcp c-axis textured (out of the film plane) microstructure is observed. At 50 nm thickness, a distinct columnar morphology has developed. A distinct subgrain structure was also observed in the thinner films (10-50 nm). The magnetization is initially in-plane and retains in-plane components up to a thickness of [approximate] 50 nm, after which it is predominantly out-of-plane. The effects of in-plane film stress are reflected in the effective anisotropy field and are most evident in the thinner films, where the stress is highest. The thinnest (10 nm) films display in-plane 180[deg] domain walls while thicker (50 nm) films exhibit out-of-plane "dot"-type domain structures. The "dot" domains were observed even in films that had not yet developed a columnar morphology. Intermediate-thickness films show a "feather-like" contrast, indicating that both in- and out-of-plane magnetization components are present. Intrinsic film stress was found to play a major role in determining the preferred magnetization direction and, thus, the resulting magnetic domain configurations. | en_US |
dc.format.extent | 1685519 bytes | |
dc.format.extent | 3118 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.language.iso | en_US | |
dc.publisher | Elsevier | en_US |
dc.title | Evolution of microstructure and magnetic properties in magnetron-sputtered CoCr thin films | en_US |
dc.type | Article | en_US |
dc.rights.robots | IndexNoFollow | en_US |
dc.subject.hlbsecondlevel | Natural Resources and Environment | en_US |
dc.subject.hlbsecondlevel | Molecular, Cellular and Developmental Biology | en_US |
dc.subject.hlbsecondlevel | Ecology and Evolutionary Biology | en_US |
dc.subject.hlbtoplevel | Health Sciences | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | North Campus EMAL, Department of Materials Science and Engineering, The University of Michigan, Ann Arbor, MI 48109-2143, USA | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/29703/1/0000035.pdf | en_US |
dc.identifier.doi | http://dx.doi.org/10.1016/0304-3991(92)90174-I | en_US |
dc.identifier.source | Ultramicroscopy | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
Files in this item
Remediation of Harmful Language
The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.
Accessibility
If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.