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Diimide formation on the Ni(100) surface

dc.contributor.authorHuang, Sean X.en_US
dc.contributor.authorRufael, Tecle S.en_US
dc.contributor.authorGland, John L.en_US
dc.date.accessioned2006-04-10T15:43:02Z
dc.date.available2006-04-10T15:43:02Z
dc.date.issued1993-06-10en_US
dc.identifier.citationHuang, Sean X., Rufael, Tecle S., Gland, John L. (1993/06/10)."Diimide formation on the Ni(100) surface." Surface Science Letters 290(1-2): L673-L676. <http://hdl.handle.net/2027.42/30743>en_US
dc.identifier.urihttp://www.sciencedirect.com/science/article/B6X4J-47G2PMB-SX/2/450ec322a8b211e800512d0b521fe41den_US
dc.identifier.urihttps://hdl.handle.net/2027.42/30743
dc.description.abstractDiimide (N2H2), an extremely reactive species, is observed as a gas phase product from the Ni(100) surface in the 200 to 450 K range during hydrazine thermal decomposition and during thermal desorption of predissociated ammonia. These results suggest that the primary mechanism for diimide formation is recombination of an adsorbed NH surface intermediate. The observation that diimide can be formed from predissociated ammonia illustrates that a nitrogen---nitrogen bond in the precursor is not required for diimide formation. Diimide formation from predissociated ammonia is enhanced by coadsorbed hydrogen, which we believe stabilizes NH on the Ni(100) surface. In addition, the direct decomposition of adsorbed N2H4 contributes to the production of diimide at 230 K.en_US
dc.format.extent326750 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherElsevieren_US
dc.titleDiimide formation on the Ni(100) surfaceen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumThe Department of Chemistry, The University of Michigan, Ann Arbor, MI 48109, USAen_US
dc.contributor.affiliationumThe Department of Chemistry, The University of Michigan, Ann Arbor, MI 48109, USAen_US
dc.contributor.affiliationumThe Department of Chemistry, The University of Michigan, Ann Arbor, MI 48109, USAen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/30743/1/0000393.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1016/0167-2584(93)90902-Uen_US
dc.identifier.sourceSurface Science Lettersen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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