Diimide formation on the Ni(100) surface
dc.contributor.author | Huang, Sean X. | en_US |
dc.contributor.author | Rufael, Tecle S. | en_US |
dc.contributor.author | Gland, John L. | en_US |
dc.date.accessioned | 2006-04-10T15:43:02Z | |
dc.date.available | 2006-04-10T15:43:02Z | |
dc.date.issued | 1993-06-10 | en_US |
dc.identifier.citation | Huang, Sean X., Rufael, Tecle S., Gland, John L. (1993/06/10)."Diimide formation on the Ni(100) surface." Surface Science Letters 290(1-2): L673-L676. <http://hdl.handle.net/2027.42/30743> | en_US |
dc.identifier.uri | http://www.sciencedirect.com/science/article/B6X4J-47G2PMB-SX/2/450ec322a8b211e800512d0b521fe41d | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/30743 | |
dc.description.abstract | Diimide (N2H2), an extremely reactive species, is observed as a gas phase product from the Ni(100) surface in the 200 to 450 K range during hydrazine thermal decomposition and during thermal desorption of predissociated ammonia. These results suggest that the primary mechanism for diimide formation is recombination of an adsorbed NH surface intermediate. The observation that diimide can be formed from predissociated ammonia illustrates that a nitrogen---nitrogen bond in the precursor is not required for diimide formation. Diimide formation from predissociated ammonia is enhanced by coadsorbed hydrogen, which we believe stabilizes NH on the Ni(100) surface. In addition, the direct decomposition of adsorbed N2H4 contributes to the production of diimide at 230 K. | en_US |
dc.format.extent | 326750 bytes | |
dc.format.extent | 3118 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.language.iso | en_US | |
dc.publisher | Elsevier | en_US |
dc.title | Diimide formation on the Ni(100) surface | en_US |
dc.type | Article | en_US |
dc.rights.robots | IndexNoFollow | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | The Department of Chemistry, The University of Michigan, Ann Arbor, MI 48109, USA | en_US |
dc.contributor.affiliationum | The Department of Chemistry, The University of Michigan, Ann Arbor, MI 48109, USA | en_US |
dc.contributor.affiliationum | The Department of Chemistry, The University of Michigan, Ann Arbor, MI 48109, USA | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/30743/1/0000393.pdf | en_US |
dc.identifier.doi | http://dx.doi.org/10.1016/0167-2584(93)90902-U | en_US |
dc.identifier.source | Surface Science Letters | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
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