High resolution photoemission study of YbAl3 at low temperature
dc.contributor.author | Cho, En-Jin | en_US |
dc.contributor.author | Oh, S. -J. | en_US |
dc.contributor.author | Olson, C. G. | en_US |
dc.contributor.author | Kang, J. -S. | en_US |
dc.contributor.author | Anderson, R. O. | en_US |
dc.contributor.author | Liu, L. Z. | en_US |
dc.contributor.author | Park, J. H. | en_US |
dc.contributor.author | Allen, J. W. | en_US |
dc.date.accessioned | 2006-04-10T15:45:33Z | |
dc.date.available | 2006-04-10T15:45:33Z | |
dc.date.issued | 1993-05-02 | en_US |
dc.identifier.citation | Cho, En-Jin, Oh, S. -J., Olson, C. G., Kang, J. -S., Anderson, R. O., Liu, L. Z., Park, J. H., Allen, J. W. (1993/05/02)."High resolution photoemission study of YbAl3 at low temperature." Physica B: Condensed Matter 186-188(): 70-73. <http://hdl.handle.net/2027.42/30796> | en_US |
dc.identifier.uri | http://www.sciencedirect.com/science/article/B6TVH-46V0GC5-M/2/997aa2d2bf673215eb3417f5eb6bac08 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/30796 | |
dc.description.abstract | The valence v and the 4f14-->4f137/4 transition energy TK of YbAl3 at low temperature were determined by the h igh resolution valence band photoemission spectroscopy. The obtained values v = 2.65+/-0.03 and TK=30+/-15 meV are consistent with the zero-temperature magnetic susceptibility [chi]m(0), supporting the Anderson Hamiltonian description for its electronic structure. | en_US |
dc.format.extent | 298395 bytes | |
dc.format.extent | 3118 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.language.iso | en_US | |
dc.publisher | Elsevier | en_US |
dc.title | High resolution photoemission study of YbAl3 at low temperature | en_US |
dc.type | Article | en_US |
dc.rights.robots | IndexNoFollow | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbsecondlevel | Mathematics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Department of Physics, University of Michigan, Ann Arbor, MI 48109-1120, USA | en_US |
dc.contributor.affiliationum | Department of Physics, University of Michigan, Ann Arbor, MI 48109-1120, USA | en_US |
dc.contributor.affiliationum | Department of Physics, University of Michigan, Ann Arbor, MI 48109-1120, USA | en_US |
dc.contributor.affiliationum | Department of Physics, University of Michigan, Ann Arbor, MI 48109-1120, USA | en_US |
dc.contributor.affiliationother | Department of Physics, Seoul National University, Seoul 151-742, South Korea | en_US |
dc.contributor.affiliationother | Department of Physics, Seoul National University, Seoul 151-742, South Korea | en_US |
dc.contributor.affiliationother | Ames laboratory, Iowa State University, Ames, IA 50011, USA | en_US |
dc.contributor.affiliationother | Research Institute of Industrial Science and Technology, Pohang 790-600, South Korea | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/30796/1/0000450.pdf | en_US |
dc.identifier.doi | http://dx.doi.org/10.1016/0921-4526(93)90497-T | en_US |
dc.identifier.source | Physica B: Condensed Matter | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
Files in this item
Remediation of Harmful Language
The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.
Accessibility
If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.