Annealing studies of magnetron-sputtered CoCr thin films
dc.contributor.author | Demczyk, Brain G. | en_US |
dc.contributor.author | Artman, J. O. | en_US |
dc.date.accessioned | 2006-04-10T15:46:30Z | |
dc.date.available | 2006-04-10T15:46:30Z | |
dc.date.issued | 1993-05-01 | en_US |
dc.identifier.citation | Demczyk, B. G., Artman, J. O. (1993/05/01)."Annealing studies of magnetron-sputtered CoCr thin films." Physica B: Condensed Matter 183(4): 351-362. <http://hdl.handle.net/2027.42/30817> | en_US |
dc.identifier.uri | http://www.sciencedirect.com/science/article/B6TVH-46FXR1H-CD/2/4c7cc966c44eb8b9f14ef838da06ec26 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/30817 | |
dc.description.abstract | The microstructure and magnetic properties of annealed CoCr thin films of various thicknesses, deposited on glass substrates, were examined. In general, little grain growth upon annealing was observed. Low-angle grain boundaries, present in as-sputtered films of thickness [les]50 nm, were absent in annealed films. This occurs simultaneously with a decrease in the measured electrical resistivity. A reduction in the in-plane film stress occurs with annealing, correspondingly the experimentally measured anisotropy field values change markedly. A noticeable feature of the microstructure is the appearance of Cr-rich regions in annealed films 50 nm thick and above. These regions are thought to account for the observed increases in the saturation magnetization and coercivity with annealing time. | en_US |
dc.format.extent | 1596693 bytes | |
dc.format.extent | 3118 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.language.iso | en_US | |
dc.publisher | Elsevier | en_US |
dc.title | Annealing studies of magnetron-sputtered CoCr thin films | en_US |
dc.type | Article | en_US |
dc.rights.robots | IndexNoFollow | en_US |
dc.subject.hlbsecondlevel | Physics | en_US |
dc.subject.hlbsecondlevel | Mathematics | en_US |
dc.subject.hlbtoplevel | Science | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | North Campus Electron Microbeam Analysis Laboratory, University of Michigan, Ann Arbor, MI, USA | en_US |
dc.contributor.affiliationother | Data Storage Systems Center, Carnegie Mellon University, Pittsburgh, PA, USA | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/30817/1/0000477.pdf | en_US |
dc.identifier.doi | http://dx.doi.org/10.1016/0921-4526(93)90125-P | en_US |
dc.identifier.source | Physica B: Condensed Matter | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
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