Low-temperature silicon wafer-to-wafer bonding using gold at eutectic temperature
dc.contributor.author | Wolffenbuttel, R. F. | en_US |
dc.contributor.author | Wise, K. D. (Kensall D.) | en_US |
dc.date.accessioned | 2006-04-10T18:10:58Z | |
dc.date.available | 2006-04-10T18:10:58Z | |
dc.date.issued | 1994-05 | en_US |
dc.identifier.citation | Wolffenbuttel, R. F., Wise, K. D. (1994/05)."Low-temperature silicon wafer-to-wafer bonding using gold at eutectic temperature." Sensors and Actuators A: Physical 43(1-3): 223-229. <http://hdl.handle.net/2027.42/31608> | en_US |
dc.identifier.uri | http://www.sciencedirect.com/science/article/B6THG-448R94P-1B/2/26d3277f4abfd9eb08abeadc39a45c66 | en_US |
dc.identifier.uri | https://hdl.handle.net/2027.42/31608 | |
dc.description.abstract | Micromechanical smart sensor and actuator systems of high complexity become commercially viable when realized as a multi-wafer device in which the mechanical functions are distributed over different wafers and one of the wafers is dedicated to contain the readout circuits. The individually-processed wafers can be assembled using wafer-to-wafer bonding and can be combined to one single functional electro-mechanical unit using through-wafer interconnect, provided that the processes involved comply with the constraints imposed by the proper operation of the active electrical and micromechanical subsystems. This implies low-temperature wafer-to-wafer bonding and through-wafer interconnect. Au/Si eutectic bonding has been investigated as it can conveniently be combined with bulk-micromachined through-wafer interconnect. The temperature control in eutectic bonding has been shown to be critical. | en_US |
dc.format.extent | 836466 bytes | |
dc.format.extent | 3118 bytes | |
dc.format.mimetype | application/pdf | |
dc.format.mimetype | text/plain | |
dc.language.iso | en_US | |
dc.publisher | Elsevier | en_US |
dc.title | Low-temperature silicon wafer-to-wafer bonding using gold at eutectic temperature | en_US |
dc.type | Article | en_US |
dc.rights.robots | IndexNoFollow | en_US |
dc.subject.hlbsecondlevel | Mechanical Engineering | en_US |
dc.subject.hlbsecondlevel | Industrial and Operations Engineering | en_US |
dc.subject.hlbtoplevel | Engineering | en_US |
dc.description.peerreviewed | Peer Reviewed | en_US |
dc.contributor.affiliationum | Center for Integrated Sensors and Circuits, Solid-state Electronics Laboratory, Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, MI, USA. | en_US |
dc.contributor.affiliationother | Laboratory for Electronic Instrumentation, Department of Electrical Engineering, Delft University of Technology, Mekelweg 4, 2628 CD Delft Netherlands | en_US |
dc.description.bitstreamurl | http://deepblue.lib.umich.edu/bitstream/2027.42/31608/1/0000537.pdf | en_US |
dc.identifier.doi | http://dx.doi.org/10.1016/0924-4247(93)00653-L | en_US |
dc.identifier.source | Sensors and Actuators A: Physical | en_US |
dc.owningcollname | Interdisciplinary and Peer-Reviewed |
Files in this item
Remediation of Harmful Language
The University of Michigan Library aims to describe its collections in a way that respects the people and communities who create, use, and are represented in them. We encourage you to Contact Us anonymously if you encounter harmful or problematic language in catalog records or finding aids. More information about our policies and practices is available at Remediation of Harmful Language.
Accessibility
If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.