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Hysteresis of contact angle of water on paraffin. Effect of surface roughness and of purity of paraffin

dc.contributor.authorRay, B. Rogeren_US
dc.contributor.authorBartell, Floyd E. (Floyd Earl)en_US
dc.date.accessioned2006-04-13T15:05:15Z
dc.date.available2006-04-13T15:05:15Z
dc.date.issued1953-04en_US
dc.identifier.citationRay, B. Roger, Bartell, F. E. (1953/04)."Hysteresis of contact angle of water on paraffin. Effect of surface roughness and of purity of paraffin." Journal of Colloid Science 8(2): 214-223. <http://hdl.handle.net/2027.42/32537>en_US
dc.identifier.urihttp://www.sciencedirect.com/science/article/B759F-4CXCS1R-6V/2/75a3c10fd5634432669b92584da85291en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/32537
dc.description.abstractThe experimental results show that when very thin films of purified paraffin were formed in vacuum by volatilization on smooth glass surfaces and water drops were placed upon them, the advancing and the receding contact angles were sensibly the same, 112[deg]; that is, hysteresis effects did not exist on these very thin and very smooth surfaces.Measurable hysteresis effects from 5[deg] to 35[deg] were found for less smooth films, and coatings of appreciable thickness formed in vacuum, in nitrogen, or in air, whether from a melt or by volatilization.The magnitude of the hysteresis effects appeared to be closely associated with the microscopic roughness of the surfaces, the roughness adding to the magnitude of the advancing angle but subtracting from the receding angle to the same degree, so that the average angle remained the same for paraffin films of different roughnesses but of the same degree of purification. The average contact angle for purified paraffin was slightly larger than the average angle for unpurified paraffin.en_US
dc.format.extent628079 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherElsevieren_US
dc.titleHysteresis of contact angle of water on paraffin. Effect of surface roughness and of purity of paraffinen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbsecondlevelChemistryen_US
dc.subject.hlbsecondlevelChemical Engineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Chemistry, University of Michigan, Ann Arbor, Michigan, USA; Department of Chemistry, University of Illinois, Urbana, Illinois.en_US
dc.contributor.affiliationumDepartment of Chemistry, University of Michigan, Ann Arbor, Michigan, USAen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/32537/1/0000645.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1016/0095-8522(53)90040-3en_US
dc.identifier.sourceJournal of Colloid Scienceen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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