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Molecular structure of nitrogen trichloride as determined by electron diffraction

dc.contributor.authorBurgi, H. B.en_US
dc.contributor.authorStedman, Donald H.en_US
dc.contributor.authorBartell, Lawrence S.en_US
dc.date.accessioned2006-04-17T16:22:10Z
dc.date.available2006-04-17T16:22:10Z
dc.date.issued1971-10en_US
dc.identifier.citationBurgi, H. B., Stedman, D., Bartell, L. S. (1971/10)."Molecular structure of nitrogen trichloride as determined by electron diffraction." Journal of Molecular Structure 10(1): 31-38. <http://hdl.handle.net/2027.42/33551>en_US
dc.identifier.urihttp://www.sciencedirect.com/science/article/B6TGS-44BMWGK-50/2/6299ff3e7ec099f3128edf8fdea410b2en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/33551
dc.description.abstractNitrogen trichloride was found to have a bond length of rg = 1.759 +/- 0.002 A and a Cl-N-Cl angle of 107.1 +/- 0.5[deg]. The bond angle is larger than that found in NF3, consistent with the (recently revised) trends displayed by the trihalides of phosphorus and arsenic, but much lower than the 120[deg] angle reported for the isoelectronic molecule N(SiH3)3. Moreover, a comparison between selected compounds reveals that the N-Cl bond length is appreciably greater, relatively, than the N-Si bond length. Accordingly, the bond angles and bond lengths suggest a greater reluctance of the nitrogen lone pairs to delocalize onto Cl than onto SiH3 groups. Mean amplitudes of vibration of NCl3 were derived both from the diffraction data and from recently published infrared and Raman frequencies. The values agree within the estimated uncertainties.en_US
dc.format.extent611398 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherElsevieren_US
dc.titleMolecular structure of nitrogen trichloride as determined by electron diffractionen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelMaterials Science and Engineeringen_US
dc.subject.hlbsecondlevelChemistryen_US
dc.subject.hlbsecondlevelChemical Engineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumDepartment of Chemistry and Institute of Science and Technology, University of Michigan, Ann Arbor, Mich. 48104 U.S.A.en_US
dc.contributor.affiliationumDepartment of Chemistry and Institute of Science and Technology, University of Michigan, Ann Arbor, Mich. 48104 U.S.A.en_US
dc.contributor.affiliationumDepartment of Chemistry and Institute of Science and Technology, University of Michigan, Ann Arbor, Mich. 48104 U.S.A.en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/33551/1/0000052.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1016/0022-2860(71)87058-8en_US
dc.identifier.sourceJournal of Molecular Structureen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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