Show simple item record

Temperature dependence of ionization rates in AlxGa1-xAs

dc.contributor.authorYeh, C.en_US
dc.contributor.authorShabde, S. N.en_US
dc.date.accessioned2006-04-17T16:25:31Z
dc.date.available2006-04-17T16:25:31Z
dc.date.issued1971-07en_US
dc.identifier.citationYeh, C., Shabde, S. N. (1971/07)."Temperature dependence of ionization rates in AlxGa1-xAs." Solid-State Electronics 14(7): 557-562. <http://hdl.handle.net/2027.42/33625>en_US
dc.identifier.urihttp://www.sciencedirect.com/science/article/B6TY5-46VKCNX-D9/2/7dbc9d635f4f7956788597d1c2e06d5cen_US
dc.identifier.urihttps://hdl.handle.net/2027.42/33625
dc.description.abstractThe ionization rates in AlxGa1-xAs have been measured in a temperature range from 77[deg]K to 373[deg]K for samples with various Al content. The results showed that the ionization rates decrease with both the Al content and temperature at a given electric field. A deviation from exp(1/E2) field dependence is observed for the sample with the highest Al content at lower temperatures. By fitting the data into the modified Baraff's plot, [lambda], the optical phonon mean free path was determined at four different temperatures. Assuming [lambda] = [lambda]0 tanh ([epsilon]r/2kT), [lambda]0, the high-energy low-temperature asymptotic limit of the mean free path was evaluated. The temperature dependence of [lambda] and the compositional dependence of [lambda]0 are discussed.en_US
dc.format.extent386134 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherElsevieren_US
dc.titleTemperature dependence of ionization rates in AlxGa1-xAsen_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelPhysicsen_US
dc.subject.hlbsecondlevelElectrical Engineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumElectron Physics Laboratory, Department of Electrical Engineering, University of Michigan, Ann Arbor, Michigan, 48104, USAen_US
dc.contributor.affiliationumElectron Physics Laboratory, Department of Electrical Engineering, University of Michigan, Ann Arbor, Michigan, 48104, USAen_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/33625/1/0000133.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1016/0038-1101(71)90131-6en_US
dc.identifier.sourceSolid-State Electronicsen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


Files in this item

Show simple item record

Remediation of Harmful Language

The University of Michigan Library aims to describe library materials in a way that respects the people and communities who create, use, and are represented in our collections. Report harmful or offensive language in catalog records, finding aids, or elsewhere in our collections anonymously through our metadata feedback form. More information at Remediation of Harmful Language.

Accessibility

If you are unable to use this file in its current format, please select the Contact Us link and we can modify it to make it more accessible to you.