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Water-density effects on phenol oxidation in supercritical water

dc.contributor.authorHenrikson, Jeffrey T.en_US
dc.contributor.authorSavage, Phillip E.en_US
dc.date.accessioned2006-04-19T13:24:55Z
dc.date.available2006-04-19T13:24:55Z
dc.date.issued2003-03en_US
dc.identifier.citationHenrikson, Jeffrey T.; Savage, Phillip E. (2003)."Water-density effects on phenol oxidation in supercritical water." AIChE Journal 49(3): 718-726. <http://hdl.handle.net/2027.42/34248>en_US
dc.identifier.issn0001-1541en_US
dc.identifier.issn1547-5905en_US
dc.identifier.urihttps://hdl.handle.net/2027.42/34248
dc.description.abstractSupercritical water oxidation (SCWO) experiments were performed in a tubular flow reactor at 420–465°C and 141–241 bar. Phenol was the organic reactant. Both pure water and a helium (1/3 by mol)–water mixture served as reaction media. Adding helium to the reaction medium permitted variation of the water concentration and system pressure independently. By decoupling the water concentration from the system pressure, it was shown that the rate of phenol disappearance during SCWO is influenced by the water concentration and not the system pressure. The experiments consistently revealed that adding helium, and thereby decreasing the water concentration at a fixed system pressure, increased the phenol conversion. In addition, experiments showed that lowering the water concentration using pure water as the solvent also increased the phenol conversion. The results suggest that dilution with helium (and perhaps other inert gases) may be a new way to control SCWO reaction rates.en_US
dc.format.extent544331 bytes
dc.format.extent3118 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypetext/plain
dc.language.isoen_US
dc.publisherWiley Subscription Services, Inc., A Wiley Companyen_US
dc.subject.otherChemistryen_US
dc.subject.otherChemical Engineeringen_US
dc.titleWater-density effects on phenol oxidation in supercritical wateren_US
dc.typeArticleen_US
dc.rights.robotsIndexNoFollowen_US
dc.subject.hlbsecondlevelChemical Engineeringen_US
dc.subject.hlbtoplevelEngineeringen_US
dc.subject.hlbtoplevelScienceen_US
dc.description.peerreviewedPeer Revieweden_US
dc.contributor.affiliationumChemical Engineering Dept., University of Michigan, Ann Arbor, MI 48109en_US
dc.contributor.affiliationumChemical Engineering Dept., University of Michigan, Ann Arbor, MI 48109 ; Chemical Engineering Dept., University of Michigan, Ann Arbor, MI 48109en_US
dc.description.bitstreamurlhttp://deepblue.lib.umich.edu/bitstream/2027.42/34248/1/690490315_ftp.pdfen_US
dc.identifier.doihttp://dx.doi.org/10.1002/aic.690490315en_US
dc.identifier.sourceAIChE Journalen_US
dc.owningcollnameInterdisciplinary and Peer-Reviewed


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